公开(公告)号：US08208139B2

公开(公告)日：2012-06-26

申请号：US12346063

申请日：2008-12-30

申请人： Edo Maria Hulsebos ,  Franciscus Godefridus Casper Bijnen ,  Patrick Warnaar

发明人： Edo Maria Hulsebos ,  Franciscus Godefridus Casper Bijnen ,  Patrick Warnaar

IPC分类号： G01B11/00

CPC分类号： G03B27/42 ,  G03F9/7003 ,  G03F9/7046 ,  G03F9/7049 ,  G03F9/7076 ,  G03F9/7088

摘要： A lithographic apparatus according to one embodiment of the invention includes an alignment system for aligning a substrate or a reticle. The alignment system includes a radiation source configured to illuminate an alignment mark on the substrate or on the reticle, the alignment mark comprising a maximum length sequence or a multi periodic coarse alignment mark. An alignment signal produced from the alignment mark is detected by a detection system. A processor determines an alignment position of the substrate or the reticle based on the alignment signal.

公开(公告)号：US08208140B2

公开(公告)日：2012-06-26

申请号：US12718485

申请日：2010-03-05

申请人： Edo Maria Hulsebos ,  Franciscus Godefridus Casper Bijnen ,  Patrick Warnaar

发明人： Edo Maria Hulsebos ,  Franciscus Godefridus Casper Bijnen ,  Patrick Warnaar

IPC分类号： G01B11/00

CPC分类号： G03B27/42 ,  G03F9/7003 ,  G03F9/7046 ,  G03F9/7049 ,  G03F9/7076 ,  G03F9/7088

摘要： A lithographic apparatus according to one embodiment of the invention includes an alignment system for aligning a substrate or a reticle. The alignment system includes a radiation source configured to illuminate an alignment mark on the substrate or on the reticle, the alignment mark comprising a maximum length sequence or a multi periodic coarse alignment mark. An alignment signal produced from the alignment mark is detected by a detection system. A processor determines an alignment position of the substrate or the reticle based on the alignment signal.

摘要翻译： 根据本发明的一个实施例的光刻设备包括用于对准衬底或掩模版的对准系统。 对准系统包括被配置为照亮衬底或掩模版上的对准标记的辐射源，对准标记包括最大长度序列或多周期性粗略对准标记。 由对准标记产生的对准信号由检测系统检测。 处理器基于对准信号确定基板或掩模版的对准位置。