公开(公告)号：US20080318427A1

公开(公告)日：2008-12-25

申请号：US12127334

申请日：2008-05-27

申请人： Eiichirou KUNITANI ,  Hirotaka SHIDA ,  Kazuhito UCHIKURA

发明人： Eiichirou KUNITANI ,  Hirotaka SHIDA ,  Kazuhito UCHIKURA

IPC分类号： H01L21/304 ,  C09K13/00 ,  C09K13/02

CPC分类号： C09K3/1463 ,  C09G1/02 ,  C09K3/1409 ,  H01L21/3212

摘要： A chemical mechanical polishing aqueous dispersion preparation set including: a first composition which includes colloidal silica having an average primary particle diameter of 15 to 40 nm and a basic compound and has a pH of 8.0 to 11.0; and a second composition which includes poly(meth)acrylic acid and an organic acid having two or more carbonyl groups other than the poly(meth)acrylic acid and has a pH of 1.0 to 5.0.

摘要翻译： 一种化学机械抛光水性分散体制剂组，包括：第一组合物，其包含平均一次粒径为15〜40nm的胶体二氧化硅和碱性化合物，pH为8.0〜11.0; 以及第二组合物，其包含聚（甲基）丙烯酸和除聚（甲基）丙烯酸以外具有两个或更多个羰基并且具有1.0至5.0的pH的有机酸。

公开(公告)号：US20110250756A1

公开(公告)日：2011-10-13

申请号：US13165980

申请日：2011-06-22

申请人： Kazuhito UCHIKURA ,  Hirotaka Shida ,  Yuuichi Hashiguchi ,  Gaku Minamihaba ,  Dai Fukushima ,  Yoshikuni Tateyama ,  Hiroyuki Yano

发明人： Kazuhito UCHIKURA ,  Hirotaka Shida ,  Yuuichi Hashiguchi ,  Gaku Minamihaba ,  Dai Fukushima ,  Yoshikuni Tateyama ,  Hiroyuki Yano

IPC分类号： H01L21/304 ,  H01L21/306 ,  B82Y99/00

CPC分类号： H01L21/7684 ,  C09G1/02 ,  C09K3/1409 ,  C09K3/1463 ,  H01L21/31053 ,  H01L21/3212

摘要： A chemical mechanical polishing aqueous dispersion comprises (A) abrasive grains, (B) at least one of quinolinecarboxylic acid and pyridinecarboxylic acid, (C) an organic acid other than quinolinecarboxylic acid and pyridinecarboxylic acid, (D) an oxidizing agent, and (E) a nonionic surfactant having a triple bond, the mass ratio (WB/WC) of the amount (WB) of the component (B) to the amount (WC) of the component (C) being 0.01 or more and less than 2, and the component (E) being shown by the following general formula (1), wherein m and n individually represent integers equal to or larger than one, provided that m+n≦50 is satisfied.

摘要翻译： 化学机械研磨用水系分散体包含（A）磨粒，（B）至少一种喹啉羧酸和吡啶羧酸，（C）除喹啉羧酸以外的有机酸和吡啶羧酸，（D）氧化剂，（E ）具有三键的非离子表面活性剂，组分（B）的量（WB）与组分（C）的量（WC）的质量比（WB / WC）为0.01以上且小于2， 并且组分（E）由以下通式（1）表示，其中m和n分别表示等于或大于1的整数，条件是满足m + n＆nlE; 50。