公开(公告)号：US06929886B2

公开(公告)日：2005-08-16

申请号：US09950038

申请日：2001-09-10

申请人： Eitan Zait ,  Vladimir Dmitriev ,  Nikolay Guletsky ,  Sergei Oshemkov

发明人： Eitan Zait ,  Vladimir Dmitriev ,  Nikolay Guletsky ,  Sergei Oshemkov

IPC分类号： B23K26/06 ,  B23K26/067 ,  B23K26/18 ,  G03F1/76 ,  G03F7/20

CPC分类号： G03F1/76 ,  B23K26/009 ,  B23K26/0624 ,  B23K26/067 ,  B23K26/0676 ,  B23K26/18 ,  Y10S430/146

摘要： A method and apparatus for manufacturing patterns on a reticle blank comprising a substrate made from material transparent to UV irradiation and having a first surface and a second opposite surface, the first surface coated with a chrome layer. The method comprises providing ultra-short pulsed laser beams, focusing means, relative displacement facilitator for facilitating relative displacement of the reticle blank relative to said at least one of a plurality of target locations, and a controller for controlling the synchronization and operation of the laser beam source, the focusing means and the relative displacement facilitator. Ultra-short pulsed laser beam is irradiated in a predetermined pattern directed at the second surface and passing through the substrate, focused on the chrome layer or on its proximity.

摘要翻译： 一种用于在掩模版坯料上制造图案的方法和装置，包括由对UV照射透明的材料制成的基底，并且具有第一表面和第二相对表面，所述第一表面涂覆有铬层。 该方法包括提供超短脉冲激光束，聚焦装置，相对位移辅助器，用于促进标线片坯体相对于多个目标位置中的所述至少一个的相对位移;以及控制器，用于控制激光器的同步和操作 光束源，聚焦装置和相对位移辅助器。 超短脉冲激光束以指向第二表面的预定图案照射并穿过基板，聚焦在铬层上或其邻近处。