Abstract:
The invention relates to a method for producing a getter device (1), wherein a getter material (3) is introduced into a container (2) and the getter material (3) is heated to a temperature under reduced pressure so that getter material (3) is deposited on an inside of the container (2). In order to be able to provide a getter device (1) in a short time that has a high getter capacity, it is provided according to the invention that during a deposition of getter material (3), the container (2) is moved relative to a zone (4) in which the container (2) is cooled.
Abstract:
The invention relates to a method for producing a getter device (1), wherein a getter material (3) is introduced into a container (2) and the getter material (3) is heated to a temperature under reduced pressure so that getter material (3) is deposited on an inside of the container (2). In order to be able to provide a getter device (1) in a short time that has a high getter capacity, it is provided according to the invention that during a deposition of getter material (3), the container (2) is moved relative to a zone (4) in which the container (2) is cooled.
Abstract:
A thermal treatment process for an article of a cast or wrought aluminum-silicon alloy with an eutectic phase. The process comprises a rapid heating of the article to an annealing temperature of 400° C. to 555° C. and maintaining the article at this temperature for a not more than 14.8 minutes.