公开(公告)号：US20120037802A1

公开(公告)日：2012-02-16

申请号：US12854008

申请日：2010-08-10

Applicant: Eric Kneedler

Inventor： Eric Kneedler

IPC: H01J37/147 ,  H01J37/26

CPC classification number: H01J37/244 ,  H01J37/28 ,  H01J2237/04 ,  H01J2237/04756 ,  H01J2237/0535

Abstract: A charged particle beam system for imaging and processing targets is disclosed, comprising a charged particle column, a secondary particle detector, and a secondary particle detection grid assembly between the target and detector. In one embodiment, the grid assembly comprises a multiplicity of grids, each with a separate bias voltage, wherein the electric field between the target and the grids may be adjusted using the grid voltages to optimize the spatial distribution of secondary particles reaching the detector. Since detector lifetime is determined by the total dose accumulated at the area on the detector receiving the largest dose, detector lifetime can be increased by making the dose into the detector more spatially uniform. A single resistive grid assembly with a radial voltage gradient may replace the separate grids. A multiplicity of deflector electrodes may be located between the target and grid to enhance shaping of the electric field.

Abstract translation: 公开了一种用于成像和处理目标的带电粒子束系统，包括带电粒子柱，二次粒子检测器和靶和检测器之间的二次粒子检测栅组件。 在一个实施例中，电网组件包括多个栅格，每个具有单独的偏置电压，其中可以使用电网电压来调整目标和栅极之间的电场，以优化到达检测器的次级颗粒的空间分布。 由于检测器寿命由在接收最大剂量的检测器上的区域累积的总剂量确定，所以可以通过使检测器的剂量在空间上更均匀地增加检测器寿命。 具有径向电压梯度的单个电阻栅组件可以替代单独的栅极。 多个偏转器电极可以位于靶和栅格之间以增强电场的形状。

公开(公告)号：US20050194534A1

公开(公告)日：2005-09-08

申请号：US11036768

申请日：2005-01-14

Applicant: Eric Kneedler ,  Robert Linder ,  Leonid Vasilyev ,  Andreas Berghaus ,  Charles Bryson

Inventor： Eric Kneedler ,  Robert Linder ,  Leonid Vasilyev ,  Andreas Berghaus ,  Charles Bryson

IPC: G01B5/004 ,  G01B21/02 ,  G01B21/04 ,  G01B21/30 ,  G01Q10/00 ,  G01Q30/04 ,  G01Q40/00 ,  G01Q60/24 ,  G21K7/00 ,  H01J37/26 ,  H01L21/66

CPC classification number: G01Q30/04

Abstract: A method of improving the precision and speed of probe microscopy. Direct geometric measurement of relevant date points allows more rapid determination of critical dimensions while improving measurement precision through minimized system drift. Precision and throughput is further improved by deflection-based measurement. Sensitivity to soft contacts is improved by using diagonal approach trajectories for the probe tip (20). And throughput is improved while risk of damage to tip and/or surface is reduced by using lateral force detection.

Abstract translation: 提高探针显微镜精度和速度的方法。 相关日期点的直接几何测量可以更快速地确定关键尺寸，同时通过最小化的系统漂移提高测量精度。 通过基于偏移的测量进一步提高了精度和产量。 通过使用探针尖端（20）的对角线方向轨迹可以改善对软触点的灵敏度。 并且通过使用侧向力检测来降低通过尖端和/或表面损伤的风险，并且提高吞吐量。

公开(公告)号：US08907305B2

公开(公告)日：2014-12-09

申请号：US13816466

申请日：2011-08-10

Applicant: Eric Kneedler ,  Jonathan H. Orloff

Inventor： Eric Kneedler ,  Jonathan H. Orloff

IPC: G21K1/00 ,  H01J37/244 ,  H01J37/28

CPC classification number: H01J37/244 ,  H01J37/28 ,  H01J2237/04 ,  H01J2237/04756 ,  H01J2237/0535

Abstract: A charged particle beam system for imaging and processing targets is disclosed, comprising a charged particle column, a secondary particle detector, and a secondary particle detection grid assembly between the target and detector. In one embodiment, the grid assembly comprises a multiplicity of grids, each with a separate bias voltage, wherein the electric field between the target and the grids may be adjusted using the grid voltages to optimize the spatial distribution of secondary particles reaching the detector. Since detector lifetime is determined by the total dose accumulated at the area on the detector receiving the largest dose, detector lifetime can be increased by making the dose into the detector more spatially uniform. A single resistive grid assembly with a radial voltage gradient may replace the separate grids. A multiplicity of deflector electrodes may be located between the target and grid to enhance shaping of the electric field.

Abstract translation: 公开了一种用于成像和处理目标的带电粒子束系统，包括带电粒子柱，二次粒子检测器和靶和检测器之间的二次粒子检测栅组件。 在一个实施例中，电网组件包括多个栅格，每个具有单独的偏置电压，其中可以使用电网电压来调整目标和栅极之间的电场，以优化到达检测器的次级颗粒的空间分布。 由于检测器寿命由在接收最大剂量的检测器上的区域累积的总剂量确定，所以可以通过使检测器的剂量在空间上更均匀地增加检测器寿命。 具有径向电压梯度的单个电阻栅组件可以替代单独的栅极。 多个偏转器电极可以位于靶和栅格之间以增强电场的形状。

公开(公告)号：US07375324B2

公开(公告)日：2008-05-20

申请号：US11104876

申请日：2005-04-13

Applicant: Robert Linder ,  Eric Kneedler

Inventor： Robert Linder ,  Eric Kneedler

IPC: G01N23/00

CPC classification number: G03F1/72 ,  G01Q80/00 ,  Y10S977/856

Abstract: An improved method for rapidly and accurately modifying small structures, including structures on a micron or nanometer scale, suitable for the repair of defects in lithographic photo-masks and semiconductors on a nano-scopic level. Features or samples repaired may be conductive or non-conductive. A single instrument can be employed to both observe the surface of the mask or wafer, and to effectuate the repair of conductive and non-conductive features thereon. Using a Stylus-Nano-Profilometer probe, rapid lateral strokes across the sample surface in a definable pattern at known high applied pressure are used to effectuate defect repair. The tip of the probe can also be dithered rapidly in a pattern or used as to create a jackhammer effect to more effectively remove material from the sample surface.

Abstract translation: 一种用于快速和准确地修改小结构（包括微米或纳米级结构）的改进方法，适用于在纳米级别的光刻光掩模和半导体中修复缺陷。 维修的特征或样品可能是导电或不导电的。 可以使用单个仪器来观察掩模或晶片的表面，并且实现其上的导电和非导电特征的修复。 使用触笔 - 纳米轮廓仪探头，在已知的高施加压力下以可定义的模式在样品表面上快速横向冲程用于实现缺陷修复。 探针的尖端也可以以图案快速抖动，或用于产生手提锤效应以更有效地从样品表面去除材料。

公开(公告)号：US20130214156A1

公开(公告)日：2013-08-22

申请号：US13816466

申请日：2011-08-10

Applicant: Eric Kneedler ,  Jonathan H. Orloff

Inventor： Eric Kneedler ,  Jonathan H. Orloff

IPC: H01J37/244

CPC classification number: H01J37/244 ,  H01J37/28 ,  H01J2237/04 ,  H01J2237/04756 ,  H01J2237/0535

Abstract: A charged particle beam system for imaging and processing targets is disclosed, comprising a charged particle column, a secondary particle detector, and a secondary particle detection grid assembly between the target and detector. In one embodiment, the grid assembly comprises a multiplicity of grids, each with a separate bias voltage, wherein the electric field between the target and the grids may be adjusted using the grid voltages to optimize the spatial distribution of secondary particles reaching the detector. Since detector lifetime is determined by the total dose accumulated at the area on the detector receiving the largest dose, detector lifetime can be increased by making the dose into the detector more spatially uniform. A single resistive grid assembly with a radial voltage gradient may replace the separate grids. A multiplicity of deflector electrodes may be located between the target and grid to enhance shaping of the electric field.

Abstract translation: 公开了一种用于成像和处理目标的带电粒子束系统，包括带电粒子柱，二次粒子检测器和靶和检测器之间的二次粒子检测栅组件。 在一个实施例中，电网组件包括多个栅格，每个具有单独的偏置电压，其中可以使用电网电压来调整目标和栅极之间的电场，以优化到达检测器的次级颗粒的空间分布。 由于检测器寿命由在接收最大剂量的检测器上的区域累积的总剂量确定，所以可以通过使检测器的剂量在空间上更均匀地增加检测器寿命。 具有径向电压梯度的单个电阻栅组件可以替代单独的栅极。 多个偏转器电极可以位于靶和栅格之间以增强电场的形状。

公开(公告)号：US08481962B2

公开(公告)日：2013-07-09

申请号：US12854008

申请日：2010-08-10

Applicant: Eric Kneedler

Inventor： Eric Kneedler

IPC: G21K5/04

CPC classification number: H01J37/244 ,  H01J37/28 ,  H01J2237/04 ,  H01J2237/04756 ,  H01J2237/0535

Abstract: A charged particle beam system for imaging and processing targets is disclosed, comprising a charged particle column, a secondary particle detector, and a secondary particle detection grid assembly between the target and detector. In one embodiment, the grid assembly comprises a multiplicity of grids, each with a separate bias voltage, wherein the electric field between the target and the grids may be adjusted using the grid voltages to optimize the spatial distribution of secondary particles reaching the detector. Since detector lifetime is determined by the total dose accumulated at the area on the detector receiving the largest dose, detector lifetime can be increased by making the dose into the detector more spatially uniform. A single resistive grid assembly with a radial voltage gradient may replace the separate grids. A multiplicity of deflector electrodes may be located between the target and grid to enhance shaping of the electric field.

Abstract translation: 公开了一种用于成像和处理目标的带电粒子束系统，包括带电粒子柱，二次粒子检测器和靶和检测器之间的二次粒子检测栅组件。 在一个实施例中，电网组件包括多个栅格，每个具有单独的偏置电压，其中可以使用电网电压来调整目标和栅极之间的电场，以优化到达检测器的次级颗粒的空间分布。 由于检测器寿命由在接收最大剂量的检测器上的区域累积的总剂量确定，所以可以通过使检测器的剂量在空间上更均匀地增加检测器寿命。 具有径向电压梯度的单个电阻栅组件可以替代单独的栅极。 多个偏转器电极可以位于靶和栅格之间以增强电场的形状。

公开(公告)号：US20050266586A1

公开(公告)日：2005-12-01

申请号：US11104876

申请日：2005-04-13

Applicant: Robert Linder ,  Eric Kneedler

Inventor： Robert Linder ,  Eric Kneedler

IPC: B82B3/00 ,  G01Q10/00 ,  G01Q70/00 ,  G01Q80/00 ,  G03F1/00 ,  H01L21/00 ,  H01L21/027

CPC classification number: G03F1/72 ,  G01Q80/00 ,  Y10S977/856

Abstract: An improved method for rapidly and accurately modifying small structures, including structures on a micron or nanometer scale, suitable for the repair of defects in lithographic photo-masks and semiconductors on a nano-scopic level. Features or samples repaired may be conductive or non-conductive. A single instrument can be employed to both observe the surface of the mask or wafer, and to effectuate the repair of conductive and non-conductive features thereon. Using a Stylus-Nano-Profilometer probe, rapid lateral strokes across the sample surface in a definable pattern at known high applied pressure are used to effectuate defect repair. The tip of the probe can also be dithered rapidly in a pattern or used as to create a jackhammer effect to more effectively remove material from the sample surface.

Abstract translation: 一种用于快速和准确地修改小结构（包括微米或纳米级结构）的改进方法，适用于在纳米级别的光刻光掩模和半导体中修复缺陷。 维修的特征或样品可能是导电或不导电的。 可以使用单个仪器来观察掩模或晶片的表面，并且实现其上的导电和非导电特征的修复。 使用触笔 - 纳米轮廓仪探头，在已知的高施加压力下以可定义的模式在样品表面上快速横向冲程用于实现缺陷修复。 探针的尖端也可以以图案快速抖动，或用于产生手提锤效应以更有效地从样品表面去除材料。