利索-全球专利检索

  1. 登录
  2. 注册

搜索结果

66 条记录 (耗时 0.022 秒)

    METHOD AND DEVICE FOR SPATIAL CHARGED PARTICLE BUNCHING
    1.
    发明公开
    METHOD AND DEVICE FOR SPATIAL CHARGED PARTICLE BUNCHING 审中-公开

    公开(公告)号：US20240112882A1

    公开(公告)日：2024-04-04

    申请号：US18333085

    申请日：2023-06-12

    申请人： NexGen Semi Holding, Inc.

    发明人： Mark Joseph Bennahmias ,  Michael John Zani ,  Jeffrey Winfield Scott

    IPC分类号： H01J37/30

    CPC分类号： H01J37/3007 ,  H01J37/3174 ,  H01J2237/04

    摘要： A charged particle buncher includes a series of spaced apart electrodes arranged to generate a shaped electric field. The series includes a first electrode, a last electrode and one- or more intermediate electrodes. The charged particle buncher includes a waveform device attached to the electrodes and configured to apply a periodic potential waveform to each electrode independently in a manner so as to form a quasi-electrostatic time varying potential gradient between adjacent electrodes and to cause spatial distribution of charged particles that form a plurality of nodes and antinodes. The nodes have a charged particle density and the antinodes have substantially no charged particle density, and the nodes and the antinodes are formed from a charged particle beam configured to hit the target.

    Adjustable Mass Resolving Aperture
    5.
    发明申请
    Adjustable Mass Resolving Aperture 审中-公开
    可调节质量分辨孔径

    公开(公告)号：US20160240350A1

    公开(公告)日：2016-08-18

    申请号：US15136524

    申请日：2016-04-22

    申请人： Glenn Lane Family Limited Liability Limited Partnership

    发明人： Glenn E. LANE

    IPC分类号： H01J37/317

    CPC分类号： H01J37/3007 ,  C23C14/48 ,  C23C14/54 ,  H01J37/08 ,  H01J37/09 ,  H01J37/3171 ,  H01J49/062 ,  H01J49/26 ,  H01J2237/0213 ,  H01J2237/04 ,  H01J2237/0455 ,  H01J2237/152 ,  H01J2237/31701 ,  H01L21/265

    摘要： Embodiments of the invention relate to a mass resolving aperture that may be used in an ion implantation system that selectively exclude ion species based on charge to mass ratio (and/or mass to charge ratio) that are not desired for implantation, in an ion beam assembly. Embodiments of the invention relate to a mass resolving aperture that is segmented, adjustable, and/or presents a curved surface to the oncoming ion species that will strike the aperture. Embodiments of the invention also relate to the filtering of a flow of charged particles through a closed plasma channel (CPC) superconductor, or boson energy transmission system.

    摘要翻译： 本发明的实施例涉及可用于离子注入系统中的质量分辨孔径，该离子注入系统基于离子束中不需要的注入质量比（和/或质荷比）来选择性地排除离子种类 部件。 本发明的实施例涉及一种质量分辨孔径，该质量分辨孔径被分段，可调节和/或呈现出将撞击孔的迎面而来的离子物质的曲面。 本发明的实施例还涉及通过封闭的等离子体通道（CPC）超导体或玻色子能量传输系统对带电粒子的流过滤。

    Method and System for Adaptively Scanning a Sample During Electron Beam Inspection
    6.
    发明申请
    Method and System for Adaptively Scanning a Sample During Electron Beam Inspection 有权
    电子束检测期间自适应扫描样品的方法和系统

    公开(公告)号：US20160155605A1

    公开(公告)日：2016-06-02

    申请号：US15018104

    申请日：2016-02-08

    申请人： KLA-Tencor Corporation

    发明人： Gary Fan ,  David Chen ,  Vivekanand Kini ,  Hong Xiao

    IPC分类号： H01J37/28 ,  H01J37/04 ,  H01J37/26

    CPC分类号： H01J37/28 ,  G01N23/2251 ,  H01J37/04 ,  H01J37/147 ,  H01J37/261 ,  H01J2237/04 ,  H01J2237/24592 ,  H01J2237/2806 ,  H01J2237/2817

    摘要： A system for adaptive electron beam scanning may include an inspection sub-system configured to scan an electron beam across the surface of a sample. The inspection sub-system may include an electron beam source, a sample stage, a set of electron-optic elements, a detector assembly and a controller communicatively coupled to one or more portions of the inspection sub-system. The controller may assess one or more characteristics of one or more portions of an area of the sample for inspection and, responsive to the assessed one or more characteristics, adjust one or more scan parameters of the inspection sub-system.

    摘要翻译： 用于自适应电子束扫描的系统可以包括配置成扫描横跨样品表面的电子束的检查子系统。 检查子系统可以包括电子束源，样本台，一组电子元件，检测器组件和通信地耦合到检查子系统的一个或多个部分的控制器。 控制器可以评估样品区域的一个或多个部分的一个或多个特征以进行检查，并且响应于所评估的一个或多个特性来调整检查子系统的一个或多个扫描参数。

    Particle beam detector
    7.
    发明授权
    Particle beam detector 有权
    粒子束检测器

    公开(公告)号：US09330882B2

    公开(公告)日：2016-05-03

    申请号：US14451289

    申请日：2014-08-04

    申请人： Raytheon Company

    发明人： Bruce Chignola ,  Timothy M. Norcott ,  Brandon W. Blackburn ,  Paul F. Martin ,  Kenneth A. Levenson

    IPC分类号： H01J37/22 ,  G01T1/29 ,  H01J37/244 ,  H01J37/26

    CPC分类号： H01J37/224 ,  H01J37/244 ,  H01J37/261 ,  H01J2237/04 ,  H01J2237/2446 ,  H01J2237/24585

    摘要： A particle beam detector is disclosed. The particle beam detector can include a particle beam receiving portion configured to convert particle beam energy to heat, and a plurality of temperature measuring devices disposed about the particle beam receiving portion. A location of a particle beam on the particle beam receiving portion can be determined by a temperature difference between at least two of the plurality of temperature measuring devices.

    摘要翻译： 公开了一种粒子束检测器。 粒子束检测器可以包括被配置为将粒子束能量转换成热的粒子束接收部分，以及围绕粒子束接收部分设置的多个温度测量装置。 颗粒束在粒子束接收部分上的位置可以通过多个温度测量装置中的至少两个之间的温度差来确定。

    Laser Atom Probe and Laser Atom Probe Analysis Methods
    8.
    发明申请
    Laser Atom Probe and Laser Atom Probe Analysis Methods 审中-公开
    激光原子探针和激光原子探针分析方法

    公开(公告)号：US20120080596A1

    公开(公告)日：2012-04-05

    申请号：US13227505

    申请日：2011-09-08

    申请人： Wilfried Vandervorst

    发明人： Wilfried Vandervorst

    IPC分类号： H01J37/26

    CPC分类号： H01J37/226 ,  H01J37/285 ,  H01J49/0004 ,  H01J2237/04 ,  H01J2237/05 ,  H01J2237/202 ,  H01J2237/248 ,  H01J2237/2855

    摘要： A laser atom probe system and a method for analysing a specimen by laser atom probe tomography are disclosed. The system includes a specimen holder whereon a specimen to be analyzed may be mounted, the specimen having a tip shape. The system further includes a detector, an electrode arranged between the specimen holder and the detector, and a voltage source configured to apply a voltage difference between the specimen tip and the electrode. The system also includes at least one laser system configured to direct a laser beam laterally at the specimen tip and a tip shape monitoring means configured to detect and monitor the tip shape, and/or a means for altering and/or controlling one or more laser parameters of said laser beam(s) so as to maintain, restore or control said specimen tip shape.

    摘要翻译： 公开了一种激光原子探针系统和通过激光原子探针层析成像分析样品的方法。 该系统包括可以安装待分析样品的样品架，样品具有尖端形状。 所述系统还包括检测器，布置在所述检体保持器和检测器之间的电极，以及被配置为施加所述检测头和所述电极之间的电压差的电压源。 该系统还包括至少一个激光系统，其被配置为在激光束的侧面引导激光束，以及尖端形状监测装置，被配置为检测和监视尖端形状，和/或用于改变和/或控制一个或多个激光器 所述激光束的参数，以便维持，恢复或控制所述样品尖端形状。

    Scanning electron microscope
    9.
    发明授权
    Scanning electron microscope 失效

    公开(公告)号：US6084238A

    公开(公告)日：2000-07-04

    申请号：US44700

    申请日：1998-03-20

    申请人： Hideo Todokoro ,  Makoto Ezumi

    发明人： Hideo Todokoro ,  Makoto Ezumi

    IPC分类号： H01J37/244 ,  H01J37/256 ,  H01J37/28 ,  H01J37/285

    CPC分类号： H01J37/244 ,  H01J37/145 ,  H01J37/268 ,  H01J37/28 ,  H01J2237/04 ,  H01J2237/04756 ,  H01J2237/2449

    摘要： A scanning microscope is provided for producing a scan image at high spatial resolution and in a low acceleration voltage area. An acceleration tube is located in an electron beam path of an objective lens for applying a post-acceleration voltage of the primary electron beam. The application of an overlapping voltage onto a sample allows a retarding electric field against the primary electron beam to be formed between the acceleration tube and the sample. The secondary electrons generated from the sample and the secondary signals such as reflected electrons are extracted into the acceleration tube through the effect of an electric field (retarding electric field) immediately before the sample. The signals are detected by secondary signal detectors located upwardly than the acceleration tube.