公开(公告)号：US20220031158A1

公开(公告)日：2022-02-03

申请号：US17279968

申请日：2019-09-24

Applicant: ESSILOR INTERNATIONAL

Inventor： Gabriel KEITA ,  Arnaud GLACET ,  Benjamin ROUSSEAU ,  Noemi BARRETO ,  Cécile PETIGNAUD

IPC: A61B3/11 ,  A61B3/14 ,  A61B3/00

Abstract: Disclosed is a method for determining at least one geometrico-morphological parameter of a subject for determining a vision correction equipment, wherein the following steps are performed: a) determining the height of one of the eyes of the subject (P) relative to a reference horizontal surface; b) placing a visual target in front of the head (HP) of the subject (P) at a predetermined position, this predetermined position being determined taking into account the height of one of the eyes of the subject relative to the reference horizontal surface, determined in step a); c) while the subject gazes at the visual target placed at the predetermined position in step b), capturing an image of the head (HP) of the subject (P) with an image capture apparatus (50); and d) deducing from the image captured in step c) the at least one geometrico-morphological parameter.

公开(公告)号：US20180215114A1

公开(公告)日：2018-08-02

申请号：US15748583

申请日：2016-07-29

Applicant: ESSILOR INTERNATIONAL

Inventor： Arnaud GLACET ,  Gérald FOURNAND

IPC: B29D11/00 ,  G02B1/111 ,  G02C7/04

CPC classification number: B29D11/00903 ,  B29D11/00865 ,  G02B1/111 ,  G02C7/04

Abstract: The invention provides a system for coating an optical article with a coating composition (50), comprising a chamber configured to receive said article, a coating device configured to carry out a coating treatment of said composition for depositing it on said article in said chamber, by vaporizing said composition and by exposing at least a face of said article to the vaporized composition, and a control unit configured to control said coating device for coating said article by vaporizing said composition; said coating device being formed as a single cartridge unit comprising a casing (41) configured to contain said composition, a vaporizing conduit (49) opening both into said casing and outside of said coating device, and a propelling member (52) configured to pressurize said composition; said coating device being configured to put in fluidic communication said propelling member in an operative state with said casing in order to carry out said coating treatment for coating an article.

公开(公告)号：US20240066817A1

公开(公告)日：2024-02-29

申请号：US18502559

申请日：2023-11-06

Applicant: Essilor International

Inventor： Peiqi JIANG ,  Arnaud GLACET ,  Zbigniew TOKARSKI

IPC: B29D11/00

CPC classification number: B29D11/0048

Abstract: The present disclosure includes systems, devices, and methods for preventing contamination during formation of an optical article. In some implementations, a device for preventing contamination of a mold cavity during injection molding of a function wafer includes a containment band having an annular base that defines a first opening configured to receive a functional wafer. The device also includes one or more sidewalls that project a first direction from and surround at least a portion of the first opening. The one or more sidewalls may be configured such that, during formation of an optical article, a first portion of the functional wafer is in contact with the one or more sidewalls.

公开(公告)号：US20210178711A1

公开(公告)日：2021-06-17

申请号：US17120763

申请日：2020-12-14

Applicant: Essilor International

Inventor： Peiqi JIANG ,  Arnaud GLACET ,  Zbigniew TOKARSKI

IPC: B29D11/00

Abstract: The present disclosure includes systems, devices, and methods for preventing contamination during formation of an optical article. In some implementations, a device for preventing contamination of a mold cavity during injection molding of a function wafer includes a containment band having an annular base that defines a first opening configured to receive a functional wafer. The device also includes one or more sidewalls that project a first direction from and surround at least a portion of the first opening. The one or more sidewalls may be configured such that, during formation of an optical article, a first portion of the functional wafer is in contact with the one or more sidewalls.