公开(公告)号：US08562891B2

公开(公告)日：2013-10-22

申请号：US13298404

申请日：2011-11-17

申请人： Eun-Hyoung Cho ,  Sung Hoon Choa ,  Jin Seung Sohn ,  Byung Kyu Lee ,  Du Hyun Lee

发明人： Eun-Hyoung Cho ,  Sung Hoon Choa ,  Jin Seung Sohn ,  Byung Kyu Lee ,  Du Hyun Lee

IPC分类号： B29C59/16

CPC分类号： B05D5/02 ,  B29C47/92 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/00 ,  G03F7/0002 ,  Y10S977/887

摘要： A process and an apparatus for performing a UV nano-imprint lithography are provided. The process uses a polymer pad which allows a uniform application of pressure to a patterned template and an easy removal of a residual resin layer. The apparatus includes a tilt and decentering corrector which allows an accurate alignment of layers during the nano-imprint lithography process.

公开(公告)号：US08087920B2

公开(公告)日：2012-01-03

申请号：US12025375

申请日：2008-02-04

申请人： Eun-Hyoung Cho ,  Sung Hoon Choa ,  Jin Seung Sohn ,  Byung Kyu Lee ,  Du Hyun Lee

发明人： Eun-Hyoung Cho ,  Sung Hoon Choa ,  Jin Seung Sohn ,  Byung Kyu Lee ,  Du Hyun Lee

IPC分类号： B29C47/92

CPC分类号： B05D5/02 ,  B29C47/92 ,  B82Y10/00 ,  B82Y40/00 ,  G03F7/00 ,  G03F7/0002 ,  Y10S977/887

摘要： A process and an apparatus for performing a UV nano-imprint lithography are provided. The process uses a polymer pad which allows a uniform application of pressure to a patterned template and an easy removal of a residual resin layer. The apparatus includes a tilt and decentering corrector which allows an accurate alignment of layers during the nano-imprint lithography process.

摘要翻译： 提供了一种用于进行UV纳米压印光刻的工艺和设备。 该方法使用聚合物垫，其允许对图案化模板均匀施加压力并容易地除去残留的树脂层。 该设备包括倾斜和偏心校正器，其允许在纳米压印光刻工艺期间精确地对准层。

公开(公告)号：US07787351B2

公开(公告)日：2010-08-31

申请号：US11851028

申请日：2007-09-06

申请人： Seung Bum Hong ,  Yun Seok Kim ,  Kwang Soo No ,  Sung Hoon Choa ,  Simon Buehlmann ,  Ji Yoon Kim

发明人： Seung Bum Hong ,  Yun Seok Kim ,  Kwang Soo No ,  Sung Hoon Choa ,  Simon Buehlmann ,  Ji Yoon Kim

IPC分类号： G11B7/00

CPC分类号： G11B9/02

摘要： A method of recording bits on a ferroelectric medium using a scanning probe or a small conductive structure and a recording medium thereof, in which bit sizes can be decreased to increase data recording density as well as to reduce losses in reproduction signals. The method includes applying switching voltages to a lower electrode of the ferroelectric medium and the probe so as to write bits while approaching the probe to or bringing the probe into contact with a surface of the ferroelectric medium; and applying a base bias voltage, which is equal or smaller in magnitude and opposite in sign to the switching voltages between the switching voltages to make the probe equipotential with an upper portion of the record medium.

摘要翻译： 使用扫描探针或小导电结构及其记录介质在铁电介质上记录位的方法，其中可以减小比特大小以增加数据记录密度以及减少再现信号中的损失。 该方法包括向铁电介质和探针的下电极施加开关电压，以便在接近探头或使探针与铁电介质的表面接触时写入位; 以及施加基本偏置电压，其大小等于或小于符号相反的开关电压之间的开关电压，以使探针与记录介质的上部等电位。

公开(公告)号：US20080180832A1

公开(公告)日：2008-07-31

申请号：US11851028

申请日：2007-09-06

申请人： Seung Bum HONG ,  Yun Seok Kim ,  Kwang Soo No ,  Sung Hoon Choa ,  Simon Buehlmann ,  Ji Yoon Kim

发明人： Seung Bum HONG ,  Yun Seok Kim ,  Kwang Soo No ,  Sung Hoon Choa ,  Simon Buehlmann ,  Ji Yoon Kim

IPC分类号： G11B21/02

CPC分类号： G11B9/02

摘要： A method of recording bits on a ferroelectric medium using a scanning probe or a small conductive structure and a recording medium thereof, in which bit sizes can be decreased to increase data recording density as well as to reduce losses in reproduction signals. The method includes applying switching voltages to a lower electrode of the ferroelectric medium and the probe so as to write bits while approaching the probe to or bringing the probe into contact with a surface of the ferroelectric medium; and applying a base bias voltage, which is equal or smaller in magnitude and opposite in sign to the switching voltages between the switching voltages to make the probe equipotential with an upper portion of the record medium.

摘要翻译： 使用扫描探针或小导电结构及其记录介质在铁电介质上记录位的方法，其中可以减小比特大小以增加数据记录密度以及减少再现信号中的损失。 该方法包括向铁电介质和探针的下电极施加开关电压，以便在接近探头或使探针与铁电介质的表面接触时写入位; 以及施加基本偏置电压，其大小等于或小于符号相反的开关电压之间的开关电压，以使探针与记录介质的上部等电位。