公开(公告)号：US20240015875A1

公开(公告)日：2024-01-11

申请号：US18471588

申请日：2023-09-21

Applicant: Excillum AB

Inventor： Johan KRONSTEDT ,  Ulf LUNDSTRÖM ,  Per TAKMAN

IPC: H05G2/00

CPC classification number: H05G2/005 ,  H05G2/003

Abstract: X-ray sources including an electron source, an adjustment means for adjusting an orientation of the electron beam generated by the electron source, a focusing means configured to focus the electron beam in accordance with a focusing setting, a beam orientation sensor arranged to generate a signal indicating an orientation of the electron beam relative to a target position, and a controller that is operably connected to the focusing means, the beam orientation sensor and the adjustment means. Also, X-ray sources including a target orientation sensor and a target adjustment means, wherein the controller is configured to cause the beam adjustment means and/or target adjustment means to adjust the relative orientation between the electron beam and the target.

公开(公告)号：US20210410260A1

公开(公告)日：2021-12-30

申请号：US17290580

申请日：2019-11-04

Applicant: Excillum AB

Inventor： Johan KRONSTEDT ,  Ulf LUNDSTRÖM ,  Per TAKMAN

IPC: H05G2/00 ,  H01J35/06 ,  H01J35/08 ,  H01J35/14 ,  H05G1/30

Abstract: X-ray sources including an electron source, an adjustment means for adjusting an orientation of the electron beam generated by the electron source, a focusing means configured to focus the electron beam in accordance with a focusing setting, a beam orientation sensor arranged to generate a signal indicating an orientation of the electron beam relative to a target position, and a controller that is operably connected to the focusing means, the beam orientation sensor and the adjustment means. Also, X-ray sources including a target orientation sensor and a target adjustment means, wherein the controller is configured to cause the beam adjustment means and/or target adjustment means to adjust the relative orientation between the electron beam and the target.