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公开(公告)号:US12110594B2
公开(公告)日:2024-10-08
申请号:US17476508
申请日:2021-09-16
Inventor: Kuan Soo Shin , Jeong Hei Choi , Yoon Kyung Jung , Min Young Cho
CPC classification number: C23C18/44 , C23C18/1641
Abstract: The present invention relates to a composition for electroless platinum plating and an electroless platinum plating method using the same, wherein it is possible to easily and safely produce a uniformly dispersed platinum thin film without expensive additional equipment by performing electroless platinum plating with a composition for electroless platinum plating containing an alcohol, an aqueous solution of a platinum chloride compound, and an aqueous solution of a basic compound.