公开(公告)号：US20150160555A1

公开(公告)日：2015-06-11

申请号：US14606189

申请日：2015-01-27

Applicant: FUJIFILM Corporation

Inventor： Shinichi SUGIYAMA ,  Tsukasa YAMANAKA ,  Ryosuke UEBA ,  Makoto MOMOTA

IPC: G03F7/16 ,  G03F7/30

CPC classification number: G03F7/167 ,  G03F7/0035 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/16 ,  G03F7/2041 ,  G03F7/30 ,  G03F7/325 ,  G03F7/38 ,  G03F7/40

Abstract: The pattern forming method of the invention includes (i) a step of forming a first film on a substrate using an actinic ray-sensitive or radiation-sensitive resin composition including a resin (A) capable of increasing the polarity by the action of an acid to decrease the solubility in a developer including an organic solvent; (ii) a step of exposing the first film; (iii) a step of developing the exposed first film using a developer including an organic solvent to form a negative tone pattern; and (iv) a step of forming a second film on the second substrate so as to cover the periphery of the negative tone pattern.

Abstract translation: 本发明的图案形成方法包括：（i）使用光化射线敏感性或辐射敏感性树脂组合物在基材上形成第一膜的步骤，所述光敏感或辐射敏感性树脂组合物包含能够通过酸的作用而提高极性的树脂（A） 以降低在包含有机溶剂的显影剂中的溶解度; （ii）暴露第一膜的步骤; （iii）使用包含有机溶剂的显影剂显影所述曝光的第一膜以形成负色调图案的步骤; 以及（iv）在第二基板上形成第二膜以覆盖负色调图案的周边的步骤。