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公开(公告)号:US20240157329A1
公开(公告)日:2024-05-16
申请号:US18531833
申请日:2023-12-07
Applicant: FUJIFILM Corporation
Inventor: Shinsuke TOKUOKA , Shigeki UEHIRA , Masato SENOO , Koji HIRONAKA
IPC: B01J20/26 , B01J20/287
CPC classification number: B01J20/262 , B01J20/287 , B01J2220/50
Abstract: A polymer that contains, in a molecular chain constituting a main chain, a skeleton derived from a dehydroabietic acid compound, an adsorbent that contains the polymer, and an adsorption apparatus that has the adsorbent.
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2.
公开(公告)号:US20190177270A1
公开(公告)日:2019-06-13
申请号:US16274246
申请日:2019-02-13
Applicant: FUJIFILM Corporation
Inventor: Koji HIRONAKA , Shohei KATAOKA , Masato SENOO , Tetsu KITAMURA , Sotaro INOMATA , Satoshi SANO , Masatoshi YUMOTO
IPC: C07C311/44 , C07C311/43 , C07C311/39 , C08G18/38 , C08G69/26 , C08G73/10
Abstract: An m-phenylenediamine compound is represented by the following General Formula (I), (II), or (III). R1 represents a hydrogen atom, an alkyl group, a cycloalkyl group, or an aryl group. R2, R3, and R4 each represent an alkyl group. R5 and R6 each represent an alkyl group. X represents a chlorine atom or a bromine atom. A method for producing a polymer compound includes obtaining a polymer compound by using the m-phenylenediamine compound represented by General Formula (I) as a raw material.
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3.
公开(公告)号:US20190176081A1
公开(公告)日:2019-06-13
申请号:US16281127
申请日:2019-02-21
Applicant: FUJIFILM Corporation
Inventor: Masato SENOO , Tetsu KITAMURA , Masatoshi YUMOTO , Motoi HARADA
Abstract: A gas separation membrane includes a gas separation layer containing a polyimide compound, and the polyimide compound has a repeating unit represented by Formula (I). The gas separation module, the gas separation device, and the gas separation method are obtained by using the gas separation membrane, Ra represents a specific tetravalent group, Rb represents a trivalent group having a specific ring, Xa represents a specific substituent, and Xb represents a hydrogen atom or a substituent. A polyimide compound represented by Formula (I-b) or (I-c), Ra represents a specific tetravalent group, Rc represents a specific divalent group, Aa, Ab, Ac, and Xb represent a hydrogen atom or a substituent, and Xc and Xd represent a specific substituent.
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