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公开(公告)号：US20210366513A1
公开(公告)日：2021-11-25
申请号：US17394567
申请日：2021-08-05
Applicant: FUJIFILM Corporation
Inventor： Wataru KIKUCHI , Masatoshi YUMOTO , Takashi IMAI
Abstract: The magnetic recording medium includes: a non-magnetic support; and a magnetic layer including a ferromagnetic powder and a binding agent on the non-magnetic support, in which the magnetic layer further includes a compound including a polyalkyleneimine chain and a vinyl polymer chain. The composition for a magnetic recording medium includes: ferromagnetic powder; and a compound including a polyalkyleneimine chain and a vinyl polymer chain.
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2.发明申请公开(公告)号：US20190295585A1
公开(公告)日：2019-09-26
申请号：US16360758
申请日：2019-03-21
Applicant: FUJIFILM Corporation
Inventor： Wataru KIKUCHI , Masatoshi YUMOTO , Takashi IMAI
Abstract: The magnetic recording medium includes: a non-magnetic support; and a magnetic layer including a ferromagnetic powder and a binding agent on the non-magnetic support, in which the magnetic layer further includes a compound including a polyalkyleneimine chain and a vinyl polymer chain. The composition for a magnetic recording medium includes: ferromagnetic powder; and a compound including a polyalkyleneimine chain and a vinyl polymer chain.
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3.发明申请公开(公告)号：US20180339275A1
公开(公告)日：2018-11-29
申请号：US16045771
申请日：2018-07-26
Applicant: FUJIFILM Corporation
Inventor： Tetsu KITAMURA , Sotaro INOMATA , Masatoshi YUMOTO , Motoi HARADA
Abstract: A gas separation membrane includes a gas separation layer containing a polyimide compound and the polyimide compound has a repeating unit represented by Formula (I). In Formula (I), Rf1, Rf4, Rf5, and Rf8 each independently represent an alkyl group. Rf2, Rf3, Rf6, Rf7, and Rf9 to Rf16 each independently represent a hydrogen atom or a substituent, and at least one of Rf2, Rf3, Rf6, Rf7, and Rf9, . . . , or Rf16 represents a specific polar group. A represents a single bond or a divalent linking group having a specific structure. R represents a mother nucleus having a specific structure.
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公开(公告)号：US20180226589A1
公开(公告)日：2018-08-09
申请号：US15943968
申请日：2018-04-03
Applicant: FUJIFILM Corporation , The University of Tokyo
Inventor： Hiroaki TSUYAMA , Kimiatsu NOMURA , Yoshihisa USAMI , Masatoshi YUMOTO , Tetsu KITAMURA , Masashi KOYANAGI , Tetsuya WATANABE , Toshihiro OKAMOTO , Junichi TAKEYA
IPC: H01L51/00 , C09D5/24 , C07D495/14 , C09B57/00 , H01L51/05
CPC classification number: H01L51/0074 , C07D495/14 , C09B57/00 , C09D5/24 , H01L51/0007 , H01L51/0558 , Y02E10/549 , Y02P70/521
Abstract: Provided are a coating solution for a non-light-emitting organic semiconductor device having high carrier mobility that contains a compound represented by Formula (2) and a solvent having a boiling point of equal to or higher than 100° C., an organic transistor, a compound, an organic semiconductor material for a non-light-emitting organic semiconductor device, a material for an organic transistor, a method for manufacturing an organic transistor, and a method for manufacturing an organic semiconductor film. (In Formula (2), R11 and R12 each independently represent a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, or an alkoxy group and may have a substituent, and an aromatic portion in Formula (2) may be substituted with a halogen atom.)
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公开(公告)号：US20180155338A1
公开(公告)日：2018-06-07
申请号：US15887174
申请日：2018-02-02
Applicant: FUJIFILM Corporation , THE UNIVERSITY OF TOKYO
Inventor： Hiroaki TSUYAMA , Masashi KOYANAGI , Eiji FUKUZAKI , Masatoshi YUMOTO , Yoshihisa USAMI , Tetsuya WATANABE , Toshihiro OKAMOTO , Junichi TAKEYA
IPC: C07D471/02 , H01L51/00 , H01L29/45 , H01L29/768
CPC classification number: C07D471/02 , C07D495/14 , C09B57/08 , H01L29/454 , H01L29/768 , H01L29/786 , H01L51/0056 , H01L51/05
Abstract: An object of the present invention is to provide an organic thin film transistor that has an organic semiconductor film manufactured by using a compound having excellent solubility to an organic solvent and that has excellent carrier mobility, a novel compound, an organic thin film transistor material, an organic semiconductor film, an organic thin film transistor composition, and a method of manufacturing an organic thin film transistor using this. The organic thin film transistor according to the present invention has an organic semiconductor film containing a compound represented by Formula (1).
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Patent Agency Ranking
6.发明申请PHOTOSENSITIVE RESIN COMPOSITION, OXIME SULFONATE COMPOUND, METHOD FOR FORMING CURED FILM, CURED FILM, ORGANIC EL DISPLAY DEVICE, AND LIQUID CRYSTAL DISPLAY DEVICE 有权光敏性树脂组合物，硫化亚铜化合物，形成固化膜的方法，固化膜，有机EL显示装置和液晶显示装置公开(公告)号：US20130171415A1
公开(公告)日：2013-07-04
申请号：US13779419
申请日：2013-02-27
Applicant: FUJIFILM Corporation
Inventor： Kyouhei SAKITA , Wataru KIKUCHI , Masatoshi YUMOTO , Masanori HIKITA
IPC: C07D335/06 , C07D307/81 , C08G18/83 , C07D335/08
CPC classification number: C07D307/78 , C07C309/00 , C07C2602/08 , C07C2603/16 , C07C2603/18 , C07D307/92 , C07D335/06 , C07D335/08 , G02F1/133345 , G02F1/136227 , G02F2202/02 , G03F7/0045 , G03F7/0046 , G03F7/0392 , G03F7/0397 , G03F7/40 , H01L27/3258 , H05B33/22
Abstract: Disclosed is a photosensitive resin composition comprising: (Component A) an oxime sulfonate compound represented by Formula (1); (Component B) a resin comprising a constituent unit having an acid-decomposable group that is decomposed by an acid to form a carboxyl group or a phenolic hydroxy group; and (Component C) a solvent wherein in Formula (1) R1 denotes an alkyl group, an aryl group, or a heteroaryl group, each R2 independently denotes a hydrogen atom, an alkyl group, an aryl group, or a halogen atom, Ar1 denotes an o-arylene group or an o-heteroarylene group, X denotes O or S, and n denotes 1 or 2, provided that of two or more R2s present in the compound, at least one denotes an alkyl group, an aryl group, or a halogen atom.
Abstract translation: 公开了一种光敏树脂组合物，其包含：（组分A）由式（1）表示的肟磺酸盐化合物; （B成分）具有酸分解成羧酸或酚羟基的具有酸分解性基团的构成单元的树脂; 和（组分C）其中在式（1）中的R 1表示烷基，芳基或杂芳基的溶剂，每个R 2独立地表示氢原子，烷基，芳基或卤素原子，Ar 1 表示邻亚芳基或邻亚芳基，X表示O或S，n表示1或2，条件是化合物中存在两个或多个R 2，至少1表示烷基，芳基， 或卤素原子。
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7.发明申请公开(公告)号：US20190177270A1
公开(公告)日：2019-06-13
申请号：US16274246
申请日：2019-02-13
Applicant: FUJIFILM Corporation
Inventor： Koji HIRONAKA , Shohei KATAOKA , Masato SENOO , Tetsu KITAMURA , Sotaro INOMATA , Satoshi SANO , Masatoshi YUMOTO
IPC: C07C311/44 , C07C311/43 , C07C311/39 , C08G18/38 , C08G69/26 , C08G73/10
Abstract: An m-phenylenediamine compound is represented by the following General Formula (I), (II), or (III). R1 represents a hydrogen atom, an alkyl group, a cycloalkyl group, or an aryl group. R2, R3, and R4 each represent an alkyl group. R5 and R6 each represent an alkyl group. X represents a chlorine atom or a bromine atom. A method for producing a polymer compound includes obtaining a polymer compound by using the m-phenylenediamine compound represented by General Formula (I) as a raw material.
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8.发明申请公开(公告)号：US20190176081A1
公开(公告)日：2019-06-13
申请号：US16281127
申请日：2019-02-21
Applicant: FUJIFILM Corporation
Inventor： Masato SENOO , Tetsu KITAMURA , Masatoshi YUMOTO , Motoi HARADA
Abstract: A gas separation membrane includes a gas separation layer containing a polyimide compound, and the polyimide compound has a repeating unit represented by Formula (I). The gas separation module, the gas separation device, and the gas separation method are obtained by using the gas separation membrane, Ra represents a specific tetravalent group, Rb represents a trivalent group having a specific ring, Xa represents a specific substituent, and Xb represents a hydrogen atom or a substituent. A polyimide compound represented by Formula (I-b) or (I-c), Ra represents a specific tetravalent group, Rc represents a specific divalent group, Aa, Ab, Ac, and Xb represent a hydrogen atom or a substituent, and Xc and Xd represent a specific substituent.
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公开(公告)号：US20190074452A1
公开(公告)日：2019-03-07
申请号：US16180118
申请日：2018-11-05
Applicant: FUJIFILM Corporation , The University of Tokyo
Inventor： Hiroaki TSUYAMA , Kimiatsu NOMURA , Yoshihisa USAMI , Masatoshi YUMOTO , Tetsu KITAMURA , Masashi KOYANAGI , Tetsuya WATANABE , Toshihiro OKAMOTO , Junichi TAKEYA
IPC: H01L51/00 , C09D5/24 , C07D495/14 , C09B57/00 , H01L51/05
Abstract: Provided are a coating solution for a non-light-emitting organic semiconductor device having high carrier mobility that contains a compound represented by Formula (2) and a solvent having a boiling point of equal to or higher than 100° C., an organic transistor, a compound, an organic semiconductor material for a non-light-emitting organic semiconductor device, a material for an organic transistor, a method for manufacturing an organic transistor, and a method for manufacturing an organic semiconductor film. (In Formula (2), R11 and R12 each independently represent a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, or an alkoxy group and may have a substituent, and an aromatic portion in Formula (2) may be substituted with a halogen atom.)
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10.发明申请COATING SOLUTION FOR NON-LIGHT-EMITTING ORGANIC SEMICONDUCTOR DEVICE, ORGANIC TRANSISTOR, COMPOUND, ORGANIC SEMICONDUCTOR MATERIAL FOR NON-LIGHT-EMITTING ORGANIC SEMICONDUCTOR DEVICE, MATERIAL FOR ORGANIC TRANSISTOR, METHOD FOR MANUFACTURING ORGANIC TRANSISTOR, AND METHOD FOR MANUFACTURING ORGANIC SEMICONDUCTOR FILM 审中-公开用于非发光有机半导体器件的涂层溶液，有机晶体管，化合物，用于非发光有机半导体器件的有机半导体材料，有机晶体材料，制造有机晶体管的方法和用于制造有机半导体膜的方法公开(公告)号：US20170012220A1
公开(公告)日：2017-01-12
申请号：US15274016
申请日：2016-09-23
Applicant: FUJIFILM Corporation , The University of Tokyo
Inventor： Hiroaki TSUYAMA , Kimiatsu NOMURA , Yoshihisa USAMI , Masatoshi YUMOTO , Tetsu KITAMURA , Masashi KOYANAGI , Tetsuya WATANABE , Toshihiro OKAMOTO , Junichi TAKEYA
IPC: H01L51/00 , C07D495/14 , C09D5/24
CPC classification number: H01L51/0074 , C07D495/14 , C09B57/00 , C09D5/24 , H01L51/0007 , H01L51/0558 , Y02E10/549 , Y02P70/521
Abstract: Provided are a coating solution for a non-light-emitting organic semiconductor device having high carrier mobility that contains a compound represented by Formula (2) and a solvent having a boiling point of equal to or higher than 100° C., an organic transistor, a compound, an organic semiconductor material for a non-light-emitting organic semiconductor device, a material for an organic transistor, a method for manufacturing an organic transistor, and a method for manufacturing an organic semiconductor film. (In Formula (2), R11 and R12 each independently represent a hydrogen atom, an alkyl group, an alkenyl group, an alkynyl group, or an alkoxy group and may have a substituent, and an aromatic portion in Formula (2) may be substituted with a halogen atom.)
Abstract translation: （式（2）中，R 11和R 12各自独立地表示氢原子，烷基，烯基，炔基或烷氧基，可以具有取代基，式（2）中的芳香族部分可以 被卤素原子取代）
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