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1.发明申请METHOD FOR MANUFACTURING ORGANIC PROCESSING FLUID FOR PATTERNING OF CHEMICAL AMPLIFICATION TYPE RESIST FILM, ORGANIC PROCESSING FLUID FOR PATTERNING OF CHEMICAL AMPLIFICATION TYPE RESIST FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE 审中-公开用于制造化学放大型电阻膜的有机加工流体的方法，用于形成化学放大型电阻膜的有机加工流体，图案形成方法，制造电子器件的方法和电子器件公开(公告)号：US20160026088A1
公开(公告)日：2016-01-28
申请号：US14872726
申请日：2015-10-01
Applicant: FUJIFILM Corporation
Inventor： Tsukasa YAMANAKA , Takashi KAWAMOTO , Naoya IGUCHI
CPC classification number: G03F7/32 , C07C29/76 , C07C45/786 , C07C67/48 , C07C67/56 , G03F7/0382 , G03F7/0397 , G03F7/325 , C07C69/24 , C07C31/125 , C07C49/04
Abstract: There is disclosed a method for manufacturing an organic processing fluid for patterning of a chemical amplification type resist film, comprising a step of causing a fluid containing an organic solvent to pass through a filtration device having a fluid input portion, a fluid output portion, and a filtration filter film provided in a flow path that connects the fluid input portion and the fluid output portion with each other, wherein an absolute value (|TI−To|) of a difference between a temperature (TI) of the fluid in the fluid input portion and a temperature (To) of the fluid in the fluid output portion is 3° C. or lower, a filtration speed of the fluid in the filtration device is 0.5 L/min/m2 or greater, and a filtration pressure by the fluid in the filtration device is 0.10 MPa or lower.
Abstract translation: 公开了一种制造用于图案化化学放大型抗蚀剂膜的有机处理流体的方法，包括使含有有机溶剂的流体通过具有流体输入部分的过滤装置，流体输出部分和 设置在将流体输入部和流体输出部彼此连接的流路中的过滤膜，其中流体中的流体的温度（TI）之间的差的绝对值（| TI-To |） 流体输出部的流体的输入部和温度（To）为3℃以下，过滤装置的流体的过滤速度为0.5L / min / m 2以上，过滤压力 过滤装置中的流体为0.10MPa以下。
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2.发明申请ORGANIC PROCESSING LIQUID FOR PATTERNING CHEMICAL AMPLIFICATION RESIST FILM, CONTAINER FOR ORGANIC PROCESSING LIQUID FOR PATTERNING CHEMICAL AMPLIFICATION RESIST FILM, AND PATTERN FORMING METHOD, METHOD OF MANUFACTURING ELECTRONIC DEVICE, AND ELECTRONIC DEVICE USING THE SAME 审中-公开用于形成化学放大电阻膜的有机加工液体，用于形成化学放大膜的有机加工液体的容器和图案形成方法，制造电子器件的方法和使用其的电子器件公开(公告)号：US20150227049A1
公开(公告)日：2015-08-13
申请号：US14697942
申请日：2015-04-28
Applicant: FUJIFILM Corporation
Inventor： Tsukasa YAMANAKA , Takashi KAWAMOTO
Abstract: According to an exemplary embodiment of the present invention, there are provided an organic treatment solution for patterning chemically amplified resist films, an organic treatment solution containing 1 ppm or less of an alkyl olefin having a carbon number of 22 or less and having a metal element concentration of 5 ppm or less for each of Na, K, Ca, Fe, Cu, Mg, Mn, Li, Al, Cr, Ni and Zn, a pattern formation method, an electronic device manufacturing method, and an electronic device use the same.
Abstract translation: 根据本发明的示例性实施方案，提供了一种用于构图化学放大抗蚀剂膜的有机处理溶液，含有1ppm或更少的碳数为22以下的具有金属元素的烷基烯烃的有机处理溶液 Na，K，Ca，Fe，Cu，Mg，Mn，Li，Al，Cr，Ni和Zn中的每一种的浓度为5ppm以下，图案形成方法，电子器件制造方法和电子器件使用 相同。
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