公开(公告)号：US20150140482A1

公开(公告)日：2015-05-21

申请号：US14606161

申请日：2015-01-27

Applicant: FUJIFILM Corporation

Inventor： Tsukasa YAMANAKA ,  Naoya IGUCHI ,  Ryosuke UEBA ,  Kei YAMAMOTO

IPC: G03F7/20

CPC classification number: G03F7/2022 ,  G03F7/0035 ,  G03F7/0392 ,  G03F7/0397 ,  G03F7/11 ,  G03F7/2041 ,  G03F7/325 ,  G03F7/70466

Abstract: A pattern forming method includes: (a) forming a first film on a substrate using an actinic ray-sensitive or radiation-sensitive resin composition (I) containing a resin of which solubility in a developer containing an organic solvent decreases due to polarity increased by an action of an acid; (b) exposing the first film; (c) developing the exposed first film using a developer containing an organic solvent to form a first negative pattern; (e) forming a second film on the substrate using an actinic ray-sensitive or radiation-sensitive resin composition (II) containing a resin of which solubility in a developer containing an organic solvent decreases due to polarity increased by an action of an acid; (f) exposing the second film; and (g) developing the exposed second film using a developer containing an organic solvent to form a second negative pattern in this order.

Abstract translation: 图案形成方法包括：（a）使用光化射线敏感性或辐射敏感性树脂组合物（I）在基材上形成第一膜，所述树脂组合物（I）含有在含有有机溶剂的显影剂中的溶解度由于极性增加而降低 酸的作用 （b）曝光第一片; （c）使用包含有机溶剂的显影剂显影所述暴露的第一膜以形成第一负图案; （e）使用包含其中含有有机溶剂的显影剂中的溶解度由于酸的作用引起极性增加的树脂的光化射线敏感性或辐射敏感性树脂组合物（II）在基材上形成第二膜; （f）使第二膜曝光; 和（g）使用包含有机溶剂的显影剂显影所暴露的第二膜，以依次形成第二负图案。

公开(公告)号：US20160342083A1

公开(公告)日：2016-11-24

申请号：US15229247

申请日：2016-08-05

Applicant: FUJIFILM Corporation

Inventor： Ryosuke UEBA ,  Naoya IGUCHI ,  Tsukasa YAMANAKA ,  Naohiro TANGO ,  Michihiro SHIRAKAWA ,  Keita KATO

IPC: G03F7/00 ,  H01L21/027 ,  G03F7/40 ,  H01L21/311 ,  G03F7/20 ,  G03F7/32

CPC classification number: G03F7/0035 ,  G03F7/0397 ,  G03F7/2053 ,  G03F7/325 ,  G03F7/40 ,  H01L21/0271 ,  H01L21/31144

Abstract: A pattern formation method includes step (i) of forming a first negative type pattern on a substrate by performing step (i-1) of forming a first film on the substrate using an actinic ray-sensitive or radiation-sensitive resin composition, step (i-2) of exposing the first film and step (i-3) of developing the exposed first film in this order; step (iii) of forming a second film at least on the first negative type pattern using an actinic ray-sensitive or radiation-sensitive resin composition (2); step (v) of exposing the second film; and step (vi) of developing the exposed second film and forming a second negative type pattern at least on the first negative type pattern.

Abstract translation: 图案形成方法包括通过使用光化射线敏感性或辐射敏感性树脂组合物在基板上形成第一膜的步骤（i-1）来在基板上形成第一负型图案的步骤（i），步骤 i-2），使第一膜和第（i-3）步曝光; 使用光化射线敏感或辐射敏感性树脂组合物（2）至少在第一负型图案上形成第二膜的步骤（iii）。 步骤（v）使第二膜曝光; 以及步骤（vi），使至少在第一负型图案上显影出曝光的第二膜并形成第二负型图案。

公开(公告)号：US20160026088A1

公开(公告)日：2016-01-28

申请号：US14872726

申请日：2015-10-01

Applicant: FUJIFILM Corporation

Inventor： Tsukasa YAMANAKA ,  Takashi KAWAMOTO ,  Naoya IGUCHI

IPC: G03F7/32 ,  C07C29/76 ,  C07C45/78 ,  C07C67/48

CPC classification number: G03F7/32 ,  C07C29/76 ,  C07C45/786 ,  C07C67/48 ,  C07C67/56 ,  G03F7/0382 ,  G03F7/0397 ,  G03F7/325 ,  C07C69/24 ,  C07C31/125 ,  C07C49/04

Abstract: There is disclosed a method for manufacturing an organic processing fluid for patterning of a chemical amplification type resist film, comprising a step of causing a fluid containing an organic solvent to pass through a filtration device having a fluid input portion, a fluid output portion, and a filtration filter film provided in a flow path that connects the fluid input portion and the fluid output portion with each other, wherein an absolute value (|TI−To|) of a difference between a temperature (TI) of the fluid in the fluid input portion and a temperature (To) of the fluid in the fluid output portion is 3° C. or lower, a filtration speed of the fluid in the filtration device is 0.5 L/min/m2 or greater, and a filtration pressure by the fluid in the filtration device is 0.10 MPa or lower.

Abstract translation: 公开了一种制造用于图案化化学放大型抗蚀剂膜的有机处理流体的方法，包括使含有有机溶剂的流体通过具有流体输入部分的过滤装置，流体输出部分和 设置在将流体输入部和流体输出部彼此连接的流路中的过滤膜，其中流体中的流体的温度（TI）之间的差的绝对值（| TI-To |） 流体输出部的流体的输入部和温度（To）为3℃以下，过滤装置的流体的过滤速度为0.5L / min / m 2以上，过滤压力 过滤装置中的流体为0.10MPa以下。