POLISHING COMPOSITION
    1.
    发明公开

    公开(公告)号:US20240199915A1

    公开(公告)日:2024-06-20

    申请号:US18275266

    申请日:2022-02-02

    CPC classification number: C09G1/02 B24B37/044 H01L21/02013

    Abstract: Provided is a polishing composition containing an abrasive, permanganate, an aluminum salt, and water. In the polishing composition, a relation of a content W1 [% by weight] of the abrasive, a concentration C1 [mM] of the permanganate, and a concentration C2 [mM] of the aluminum salt satisfies at least one condition of the following conditions [A], [B], and [C]:


    satisfying both of 500≤(C1/W1) and 0.04≤(C2/C1);  [A]



    satisfying both of 200≤(C1/√(W1)) and 8≤C2; and  [B]



    satisfying both of 500≤(C1/W1) and 8≤C2.  [C]

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