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公开(公告)号：US20220206232A1
公开(公告)日：2022-06-30
申请号：US17551543
申请日：2021-12-15
发明人： Keren ZHANG , Ankit VORA , Igor ABRAMSON , Nihar Ranjan MOHANTY
摘要： A multi-layer waveguide display includes a base waveguide layer, one or more grating couplers on one or two surfaces of the base waveguide layer, an overcoat layer on each grating coupler of the one or more grating couplers and filling grating grooves of the grating coupler, and a first waveguide layer stack on a first side of the base waveguide layer. The first waveguide layer stack includes one or more polymer layers. Each of the one or more polymer layers is characterized by a respective refractive index lower than the refractive index of the base waveguide layer. Each polymer layer is formed in a plurality of process cycles, where each process cycle includes dispensing a two-dimensional array of droplets of a resin material to form a thin layer and cross-linking the thin layer to form a sublayer of the polymer layer.
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公开(公告)号：US20220204790A1
公开(公告)日：2022-06-30
申请号：US17555101
申请日：2021-12-17
发明人： Keren ZHANG , Ankit VORA , Igor ABRAMSON , Sara AZARI
IPC分类号： C09D11/38 , C09D11/106 , B41M5/00 , B41M3/00 , F21V8/00
摘要： A formulation for inkjet printing includes one or more solvents and a plurality of nanoparticles mixed with the one or more solvents. The plurality of nanoparticles has a first refractive index greater than 1.9. A method includes depositing a layer of the formulation by inkjet printing onto a substrate having a non-flat. The method thereby forms coating of the formulation having a first surface conforming to the non-flat surface of the substrate and a second surface, opposite to the first surface, being a flat surface. An optical device includes a surface relief grating and a coating layer disposed on the surface relief grating. The coating layer includes a plurality of nanoparticles having a refractive index greater than 1.45 and a resin. The plurality of nanoparticles has functional ligands cross-linked with the resin.
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公开(公告)号：US20220082936A1
公开(公告)日：2022-03-17
申请号：US17024081
申请日：2020-09-17
摘要： Gray-tone lithography techniques for controlling the thickness profile of an overcoat layer on a surface-relief grating that has a non-uniform grating parameter (e.g., depth, duty cycle, or period), compensating for the non-uniform etch rate in a large area, defining etch/block regions, and/or controlling the thickness of the grating layer.
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公开(公告)号：US20220332896A1
公开(公告)日：2022-10-20
申请号：US17687499
申请日：2022-03-04
IPC分类号： C08G75/0209 , G03H1/04 , G03H1/02 , G02B27/01
摘要： The disclosure provides recording materials including halogenated derivatized monomers and polymers for use in volume Bragg gratings, including, but not limited to, volume Bragg gratings for holography applications. Several structures are disclosed for halogenated derivatized monomers and polymers for use in Bragg gratings applications, leading to materials with higher refractive index, low birefringence, and high transparency. The disclosed halogenated derivatized monomers and polymers thereof can be used in any volume Bragg gratings materials, including two-stage polymer materials where a matrix is cured in a first step, and then the volume Bragg grating is written by way of a second curing step of a monomer.
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公开(公告)号：US20220082739A1
公开(公告)日：2022-03-17
申请号：US17024072
申请日：2020-09-17
摘要： A method of fabricating gratings with variable grating depths including depositing a first grating material layer with a uniform thickness profile on a substrate, forming an etch mask layer having a variable thickness profile on the first grating material layer, etching the etch mask layer and the first grating material layer to change the uniform thickness profile of the first grating material layer to a non-uniform thickness profile, forming a patterned hard mask on the first grating material layer, and etching, using the patterned hard mask, the first grating material layer to form a grating with a variable depth in the first grating material layer.
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公开(公告)号：US20200271850A1
公开(公告)日：2020-08-27
申请号：US16799532
申请日：2020-02-24
摘要： Disclosed herein are techniques for fabricating straight or slanted variable-etch-depth gratings. A photoresist material for fabricating a variable-etch-depth grating in a substrate is sensitive to light with a wavelength shorter than 300 nm and has an etch rate comparable to the etch rate of the substrate. A depth of an exposed portion of a photoresist material layer including the photoresist material correlates with the exposure dose. After exposure using a gray-scale mask and development, the photoresist material layer has a non-uniform thickness. The photoresist material layer with the non-uniform thickness and the underlying substrate are etched using a straight etching or slanted etching process to form the straight or slanted variable-etch-depth grating in the substrate. The variable-etch-depth grating is characterized by a non-uniform depth profile corresponding to the non-uniform thickness of the photoresist material layer before etching.
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公开(公告)号：US20220019015A1
公开(公告)日：2022-01-20
申请号：US17364678
申请日：2021-06-30
发明人： Giuseppe CALAFIORE , Tingling RAO , Ankit VORA , Peter TOPALIAN
摘要： The disclosure provides high refractive index ceramic material nanoimprint lithography (NIL) gratings having a relatively lower amount of carbon compared to traditional NIL gratings, and methods of making and using thereof, and devices including such gratings. The ceramic material includes one or more of titanium oxide, zirconium oxide, hafnium oxide, tungsten oxide, zinc tellurium, gallium phosphide, or any combination or derivative thereof.
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8.发明申请公开(公告)号：US20200249568A1
公开(公告)日：2020-08-06
申请号：US16779446
申请日：2020-01-31
发明人： Tingling RAO , Zachary PERLMUTTER , Ankit VORA , Austin LANE , Giuseppe CALAFIORE , Matthew E. COLBURN
IPC分类号： G03F7/00 , C08L63/00 , C09D11/101 , B82Y40/00
摘要： Disclosed herein is a nanoimprint lithography (ML) precursor material comprising a base resin component having a first refractive index ranging from 1.45 to 1.80, and a nanoparticles component having a second refractive index greater than the first refractive index of the base resin component. According to certain embodiments, further disclosed herein are a cured NIL material made by curing the NIL precursor material, a NIL grating comprising the cured NIL material, an optical component comprising the NIL grating, and methods for forming the NIL grating and the optical component using a NIL process.
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9.发明申请公开(公告)号：US20200247073A1
公开(公告)日：2020-08-06
申请号：US16778492
申请日：2020-01-31
摘要： Disclosed herein are materials for nanoimprinting lithography (NIL) and devices molded from the materials using NIL processes. According to certain aspects, an NIL material includes a mixture including a light-sensitive base resin and nanoparticles. The light-sensitive base resin is characterized by a first refractive index ranging from 1.58 to 1.77. The nanoparticles are characterized by a second refractive index greater than the first refractive index of the light-sensitive base resin. The mixture is curable to form a cured material characterized by a third refractive index greater than 1.78. The nanoparticles include from 45 wt. % to 90 wt. % of the cured material.
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