-
公开(公告)号:US20120280195A1
公开(公告)日:2012-11-08
申请号:US13117372
申请日:2011-05-27
IPC分类号: H01L45/00
CPC分类号: H01L45/06 , H01L27/2409 , H01L27/2436 , H01L27/2445 , H01L27/2472 , H01L45/1233 , H01L45/126 , H01L45/142 , H01L45/143 , H01L45/144 , H01L45/148
摘要: Resistance variable memory cells and methods are described herein. One or more methods of forming a resistance variable memory cell include forming a silicide material on a terminal of a select device associated with the resistance variable memory cell, forming a modified region of the silicide material by modifying a resistivity of a region of the silicide material, forming a conductive element on at least a portion of the modified region, and forming a resistance variable material on the conductive element.
摘要翻译: 本文描述了电阻变量存储单元和方法。 形成电阻可变存储单元的一种或多种方法包括在与电阻可变存储单元相关联的选择器件的端子上形成硅化物材料,通过改变硅化物材料的区域的电阻率来形成硅化物材料的修饰区域 在所述改性区域的至少一部分上形成导电元件,以及在所述导电元件上形成电阻变化材料。