公开(公告)号：US20130287405A1

公开(公告)日：2013-10-31

申请号：US13932971

申请日：2013-07-01

Applicant: FINISAR CORPORATION

Inventor： Ashish K. Verma ,  Tsurugi Sudo ,  Sumesh Mani K. Thiyagarajan ,  David Bruce Young

IPC: H01S5/12

CPC classification number: H01S5/12 ,  B82Y20/00 ,  H01S5/1231 ,  H01S5/209 ,  H01S5/3406 ,  H01S5/34306

Abstract: In one example embodiment, a DFB laser includes a substrate; an active region positioned above the substrate; a grating layer positioned above the active region, the grating layer including a portion that serves as a primary etch stop layer; a secondary etch stop layer positioned above the grating layer; and a spacer layer interposed between the grating layer and the secondary etch stop layer.

Abstract translation: 在一个示例性实施例中，DFB激光器包括基板; 位于所述基板上方的有源区域; 位于有源区上方的光栅层，所述光栅层包括用作主蚀刻停止层的部分; 位于光栅层上方的次蚀刻停止层; 以及插入在光栅层和次蚀刻停止层之间的间隔层。

公开(公告)号：US08705582B2

公开(公告)日：2014-04-22

申请号：US13932971

申请日：2013-07-01

Applicant: Finisar Corporation

Inventor： Ashish K. Verma ,  Tsurugi Sudo ,  Sumesh Mani K. Thiyagarajan ,  David Bruce Young

IPC: H01S5/00

CPC classification number: H01S5/12 ,  B82Y20/00 ,  H01S5/1231 ,  H01S5/209 ,  H01S5/3406 ,  H01S5/34306

Abstract: In one example embodiment, a DFB laser includes a substrate; an active region positioned above the substrate; a grating layer positioned above the active region, the grating layer including a portion that serves as a primary etch stop layer; a secondary etch stop layer positioned above the grating layer; and a spacer layer interposed between the grating layer and the secondary etch stop layer.

Abstract translation: 在一个示例性实施例中，DFB激光器包括基板; 位于所述基板上方的有源区域; 位于有源区上方的光栅层，所述光栅层包括用作主蚀刻停止层的部分; 位于光栅层上方的次蚀刻停止层; 以及插入在光栅层和次蚀刻停止层之间的间隔层。