Optical semiconductor device and method of manufacturing optical semiconductor device
    10.
    发明授权
    Optical semiconductor device and method of manufacturing optical semiconductor device 有权
    光半导体器件及其制造方法

    公开(公告)号:US08729526B2

    公开(公告)日:2014-05-20

    申请号:US12965588

    申请日:2010-12-10

    Applicant: Nobuaki Hatori

    Inventor: Nobuaki Hatori

    Abstract: An optical semiconductor device includes a substrate; and an active layer disposed on the substrate, wherein the active layer includes a first barrier layer containing GaAs, a quantum dot layer, which is disposed on the first barrier layer, which includes a quantum dot containing InAs, which includes a side barrier layer which covers at least a part of the quantum dot and a side surface of the quantum dot, and having an elongation strain inherent therein, and a second barrier layer disposed on the quantum dot layer.

    Abstract translation: 光学半导体器件包括衬底; 以及设置在所述基板上的有源层,其中所述有源层包括含有GaAs的第一势垒层,设置在所述第一势垒层上的量子点层,所述量子点层包括含有InAs的量子点,所述量子点包括侧阻挡层, 覆盖量子点的至少一部分和量子点的侧表面,并且其中固有的伸长应变和设置在量子点层上的第二阻挡层。

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