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1.发明申请Apparatus and method for the detection of a surface reaction, especially for cleaning of an arbitrary two-dimensional surface or three-dimensional body 审中-公开用于检测表面反应的装置和方法，特别是用于清洁任意的二维表面或三维体公开(公告)号：US20070143032A1
公开(公告)日：2007-06-21
申请号：US11522783
申请日：2006-09-15
申请人： Fokko Wieringa , Norbertus Koster , Roland Van Vliet , Marco Wedowski , Nadyeh Shariloo , Thomas Stein
发明人： Fokko Wieringa , Norbertus Koster , Roland Van Vliet , Marco Wedowski , Nadyeh Shariloo , Thomas Stein
IPC分类号： G01N31/00
CPC分类号： G01N31/22 , A61B90/70 , G03F7/70916 , G03F7/70925
摘要： There is provided an apparatus that includes a film that undergoes a chemical reaction when exposed to a species. The chemical reaction causes an alteration of a physical property of the film as an indicator of the species.
摘要翻译： 提供了一种装置，其包括当暴露于物种时经历化学反应的膜。 化学反应导致膜的物理性质的改变作为物种的指示剂。
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2.发明申请Lithographic projection apparatus, device manufacturing method and device manufactured thereby 有权平版印刷设备，装置制造方法和由此制造的装置公开(公告)号：US20050112508A1
公开(公告)日：2005-05-26
申请号：US10973250
申请日：2004-10-27
IPC分类号： G02B17/00 , G03F7/20 , H01L21/027
CPC分类号： G03F7/70925 , G03F7/70883 , G03F7/70933
摘要： In-situ cleaning of optical components for use in a lithographic projection apparatus can be carried out by irradiating a space within the apparatus containing the optical component with UV or EUV radiation having a wavelength of less than 250 nm, in the presence of molecular oxygen. Generally, the space will be purged with an ozoneless purge gas which contains a small amount of molecular oxygen in addition to the usual purge gas composition. The technique can also be used in an evacuated space by introducing a low pressure of molecular oxygen into the space.
摘要翻译： 用于光刻投影装置的光学部件的原位清洁可以通过在分子氧的存在下用包含波长小于250nm的UV或EUV辐射在含有光学部件的装置内照射空间来进行。 通常，除了通常的清洗气体组合物之外，空间将被除去含有少量分子氧的无臭吹扫气体吹扫。 该技术也可以通过将低分子氧引入该空间而在真空空间中使用。
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