摘要:
A Method of Manufacturing an Integrated Magneto-Optical Element for use in a Digital Magneto-Optical Signal write/Read Head and an Integrated Magneto-Optical Element Manufactured According to the Method A method of manufacturing an integrated magneto-optical element for use in a digital magneto-optical signal read/write head, in which the manufacturing techniques of thin film coils are combined with lens-making techniques to realise a high performance, reliable and cost-effective lens-MFM coil combination for use in a slider having an air bearing surface for “flying” just above a surface of a storage medium (102) during operation. The method comprises two principal steps: Step I is to make an MFM coil (106) by means of a thin film technique, and Step 2 is to make an objective lens (114) on top of the transparent (e.g. glass) plate (109) in which the MFM coil (106) is located.
摘要:
An optical scanning device for scanning an information layer of an optical record carrier and including a rotary aim (2; 102; 202; 302; 402; 502) which is arranged to swing about a rotation axis (CR) to alter an angular position of the rotary arm about the rotation axis; a detector arrangement (10) arranged separate from the rotary arm (2; 102; 202; 302; 402; 502) for detecting a radiation beam spot, the radiation beam spot (40; 140; 240; 340; 440; 540) having an angular disposition; a first reflective surface (4; 104; 204; 304; 404; 504) attached to the rotary arm (2; 102; 202; 302; 402; 502); a second reflective surface (6; 106; 206; 306; 406; 506) attached to the rotary arm (2; 102; 302; 402; 502); a first light path (LP 1; LP 1 O 1; LP201; LP301; LP401; LP501; running from a location on the record carrier to said first reflective surface; a second light path (LP2; LP102; LP202; LP302; LP402; LP502) running from said first reflective surface to said second reflective surface; a third light path (LP3; LP103; LP203; LP303; LP403; LP503) running from said second reflective surface to said detector arrangement (10). The rotary arm includes at least one optical inversion element (52; 54; 56; 58; 64; 66) arranged such that a dependence between variation of the angular disposition of the radiation beam spot and variation of the angular position of the rotary arm is reduced.
摘要:
The inventions relates to a lithography system in which an electronic image pattern is delivered to a exposure tool for projecting an image to a target surface, said exposure tool comprising a control unit for controlling exposure projections, said control unit at least partly being included in the projection space of the said exposure tool, and being provided with control data by means of light signals, said light signals being coupled in to said control unit by using a free space optical interconnect comprising modulated light beams that are emitted to a light sensitive part of said control unit, wherein the modulated light beams are coupled in to said light sensitive part using a holed mirror for on axis incidence of said light beams on said light sensitive part, the hole or, alternatively, holes of said mirror being provided for passage of said exposure projections.
摘要:
The inventions relates to a lithography system in which an electronic image pattern is delivered to a exposure tool for projecting an image to a target surface, said exposure tool comprising a control unit for controlling exposure projections, said control unit at least partly being included in the projection space of the said exposure tool, and being provided with control data by means of light signals, said light signals being coupled in to said control unit by using a free space optical interconnect comprising modulated light beams that are emitted to a light sensitive part of said control unit, wherein the modulated light beams are coupled in to said light sensitive part using a holed mirror for on axis incidence of said light beams on said light sensitive part, the hole or, alternatively, holes of said mirror being provided for passage of said exposure projections.
摘要:
The inventions relates to a lithography system in which an electronic image pattern is delivered to a exposure tool for projecting an image to a target surface, said exposure tool comprising a control unit for controlling exposure projections, said control unit at least partly being included in the projection space of the said exposure tool, and being provided with control data by means of light signals, said light signals being coupled in to said control unit by using a free space optical interconnect comprising modulated light beams that are emitted to a light sensitive part of said control unit, wherein the modulated light beams are coupled in to said light sensitive part using a holed mirror for on axis incidence of said light beams on said light sensitive part, the hole or, alternatively, holes of said mirror being provided for passage of said exposure projections.
摘要:
The invention relates to an information carrier (101) intended to be read and/or written by a periodic array of light spots, said information carrier (101) comprising a data area (105) defined by a set of elementary data areas, a first periodic structure (108) intended to interfere with said periodic array of light spots for generating a first moiré pattern, a second periodic structure (109) intended to interfere with said periodic array of light spots for generating a second moiré pattern, said second periodic structure (109) being arranged perpendicularly to said first periodic structure (108). The invention also relates to an apparatus for reading and/or writing said information carrier (101).