Integrated magneto-Optical Write/Read Head
    1.
    发明申请
    Integrated magneto-Optical Write/Read Head 审中-公开
    集成磁光写/读头

    公开(公告)号:US20080043578A1

    公开(公告)日:2008-02-21

    申请号:US10598876

    申请日:2005-03-08

    IPC分类号: G11B7/22

    摘要: A Method of Manufacturing an Integrated Magneto-Optical Element for use in a Digital Magneto-Optical Signal write/Read Head and an Integrated Magneto-Optical Element Manufactured According to the Method A method of manufacturing an integrated magneto-optical element for use in a digital magneto-optical signal read/write head, in which the manufacturing techniques of thin film coils are combined with lens-making techniques to realise a high performance, reliable and cost-effective lens-MFM coil combination for use in a slider having an air bearing surface for “flying” just above a surface of a storage medium (102) during operation. The method comprises two principal steps: Step I is to make an MFM coil (106) by means of a thin film technique, and Step 2 is to make an objective lens (114) on top of the transparent (e.g. glass) plate (109) in which the MFM coil (106) is located.

    摘要翻译: 一种制造用于数字磁光信号写/读头和集成磁光元件的集成磁光元件的制造方法根据该方法制造用于数字化的集成磁光元件的方法 磁光信号读/写头,其中薄膜线圈的制造技术与透镜制造技术相结合,以实现用于具有空气轴承的滑块的高性能,可靠和成本有效的透镜MFM线圈组合 在运行期间恰好在存储介质(102)的表面上方“飞行”的表面。 该方法包括两个主要步骤:步骤I是通过薄膜技术制造MFM线圈(106),步骤2是在透明(例如玻璃)板(109)的顶部上制成物镜(114) ),其中MFM线圈(106)位于其中。

    Optical scanning device
    2.
    发明授权
    Optical scanning device 失效
    光学扫描装置

    公开(公告)号:US07209413B2

    公开(公告)日:2007-04-24

    申请号:US10521658

    申请日:2003-07-02

    IPC分类号: G11B7/00

    摘要: An optical scanning device for scanning an information layer of an optical record carrier and including a rotary aim (2; 102; 202; 302; 402; 502) which is arranged to swing about a rotation axis (CR) to alter an angular position of the rotary arm about the rotation axis; a detector arrangement (10) arranged separate from the rotary arm (2; 102; 202; 302; 402; 502) for detecting a radiation beam spot, the radiation beam spot (40; 140; 240; 340; 440; 540) having an angular disposition; a first reflective surface (4; 104; 204; 304; 404; 504) attached to the rotary arm (2; 102; 202; 302; 402; 502); a second reflective surface (6; 106; 206; 306; 406; 506) attached to the rotary arm (2; 102; 302; 402; 502); a first light path (LP 1; LP 1 O 1; LP201; LP301; LP401; LP501; running from a location on the record carrier to said first reflective surface; a second light path (LP2; LP102; LP202; LP302; LP402; LP502) running from said first reflective surface to said second reflective surface; a third light path (LP3; LP103; LP203; LP303; LP403; LP503) running from said second reflective surface to said detector arrangement (10). The rotary arm includes at least one optical inversion element (52; 54; 56; 58; 64; 66) arranged such that a dependence between variation of the angular disposition of the radiation beam spot and variation of the angular position of the rotary arm is reduced.

    摘要翻译: 一种用于扫描光学记录载体的信息层并包括旋转瞄准镜(2; 102; 202; 302; 402; 502)的光学扫描装置,其被设置成围绕旋转轴线(CR)摆动以改变角度位置 旋转臂围绕旋转轴线; 与所述旋转臂(2; 102; 202; 302; 402; 502)分开布置的用于检测辐射束点的检测器装置(10),所述辐射束点(40; 140; 240; 340; 440; 540)具有 角度配置; 附接到旋转臂(2; 102; 202; 302; 402; 502)的第一反射表面(4; 104; 204; 304; 404; 504) 附接到旋转臂(2; 102; 302; 402; 502)的第二反射表面(6; 106; 206; 306; 406; 506) 第一光路(LP 1; LP 1 O 1; LP 201; LP 301; LP 401; LP 501;从记录载体上的位置运行到所述第一反射表面;第二光路(LP 2; LP 102; LP 202; LP 302; LP 402; LP 502),从所述第一反射表面延伸到所述第二反射表面;第三光路(LP 3; LP 103; LP 203; LP 303; LP 403; LP 503) 所述旋转臂包括至少一个光学反转元件(52; 54; 56; 58; 64; 66),所述至少一个光学反转元件被布置成使得所述辐射束光斑的角度配置的变化之间的相关性 并且减小了旋转臂的角位置的变化。

    Lithography system and projection method
    3.
    发明授权
    Lithography system and projection method 有权
    光刻系统和投影方法

    公开(公告)号:US08242467B2

    公开(公告)日:2012-08-14

    申请号:US12728965

    申请日:2010-03-22

    IPC分类号: G21K5/04

    摘要: The inventions relates to a lithography system in which an electronic image pattern is delivered to a exposure tool for projecting an image to a target surface, said exposure tool comprising a control unit for controlling exposure projections, said control unit at least partly being included in the projection space of the said exposure tool, and being provided with control data by means of light signals, said light signals being coupled in to said control unit by using a free space optical interconnect comprising modulated light beams that are emitted to a light sensitive part of said control unit, wherein the modulated light beams are coupled in to said light sensitive part using a holed mirror for on axis incidence of said light beams on said light sensitive part, the hole or, alternatively, holes of said mirror being provided for passage of said exposure projections.

    摘要翻译: 本发明涉及一种光刻系统,其中电子图像图案被传送到用于将图像投影到目标表面的曝光工具,所述曝光工具包括用于控制曝光投影的控制单元,所述控制单元至少部分地包括在 所述曝光工具的投影空间,并且通过光信号提供控制数据,所述光信号通过使用自由空间光学互连而耦合到所述控制单元,所述自由空间光学互连包括发射到光敏部分的光敏部分的调制光束 所述控制单元,其中所述调制光束使用用于所述光束在所述光敏部分上的轴入射的孔眼耦合到所述光敏部分,所述孔或者所述反射镜的孔可选地用于通过 曝光预测

    LITHOGRAPHY SYSTEM AND PROJECTION METHOD
    4.
    发明申请
    LITHOGRAPHY SYSTEM AND PROJECTION METHOD 有权
    LITHOGRAPHY系统和投影方法

    公开(公告)号:US20100171046A1

    公开(公告)日:2010-07-08

    申请号:US12728965

    申请日:2010-03-22

    IPC分类号: H01J37/30

    摘要: The inventions relates to a lithography system in which an electronic image pattern is delivered to a exposure tool for projecting an image to a target surface, said exposure tool comprising a control unit for controlling exposure projections, said control unit at least partly being included in the projection space of the said exposure tool, and being provided with control data by means of light signals, said light signals being coupled in to said control unit by using a free space optical interconnect comprising modulated light beams that are emitted to a light sensitive part of said control unit, wherein the modulated light beams are coupled in to said light sensitive part using a holed mirror for on axis incidence of said light beams on said light sensitive part, the hole or, alternatively, holes of said mirror being provided for passage of said exposure projections.

    摘要翻译: 本发明涉及一种光刻系统,其中电子图像图案被传送到用于将图像投影到目标表面的曝光工具,所述曝光工具包括用于控制曝光投影的控制单元,所述控制单元至少部分地包括在 所述曝光工具的投影空间,并且通过光信号提供控制数据,所述光信号通过使用自由空间光学互连而耦合到所述控制单元,所述自由空间光学互连包括发射到光敏部分的光敏部分的调制光束 所述控制单元,其中所述调制光束使用用于所述光束在所述光敏部分上的轴入射的孔眼耦合到所述光敏部分,所述孔或者所述反射镜的孔可选地用于通过 曝光预测

    Lithography system and projection method
    5.
    发明授权
    Lithography system and projection method 失效
    光刻系统和投影方法

    公开(公告)号:US07709815B2

    公开(公告)日:2010-05-04

    申请号:US11521671

    申请日:2006-09-15

    IPC分类号: G21K5/04 G21K1/00

    摘要: The inventions relates to a lithography system in which an electronic image pattern is delivered to a exposure tool for projecting an image to a target surface, said exposure tool comprising a control unit for controlling exposure projections, said control unit at least partly being included in the projection space of the said exposure tool, and being provided with control data by means of light signals, said light signals being coupled in to said control unit by using a free space optical interconnect comprising modulated light beams that are emitted to a light sensitive part of said control unit, wherein the modulated light beams are coupled in to said light sensitive part using a holed mirror for on axis incidence of said light beams on said light sensitive part, the hole or, alternatively, holes of said mirror being provided for passage of said exposure projections.

    摘要翻译: 本发明涉及一种光刻系统,其中电子图像图案被传送到用于将图像投影到目标表面的曝光工具,所述曝光工具包括用于控制曝光投影的控制单元,所述控制单元至少部分地包括在 所述曝光工具的投影空间,并且通过光信号提供控制数据,所述光信号通过使用自由空间光学互连而耦合到所述控制单元,所述自由空间光学互连包括发射到光敏部分的光敏部分的调制光束 所述控制单元,其中所述调制光束使用用于所述光束在所述光敏部分上的轴入射的孔眼耦合到所述光敏部分,所述孔或者所述反射镜的孔可选地用于通过 曝光预测

    Information carrier, and system for positioning such an information carrier in a reading and/or writing apparatus
    6.
    发明授权
    Information carrier, and system for positioning such an information carrier in a reading and/or writing apparatus 失效
    信息载体和用于将这种信息载体定位在读取和/或写入装置中的系统

    公开(公告)号:US07433256B2

    公开(公告)日:2008-10-07

    申请号:US11568243

    申请日:2005-04-21

    IPC分类号: G11C7/00

    CPC分类号: G11B7/0033 G11B7/0938

    摘要: The invention relates to an information carrier (101) intended to be read and/or written by a periodic array of light spots, said information carrier (101) comprising a data area (105) defined by a set of elementary data areas, a first periodic structure (108) intended to interfere with said periodic array of light spots for generating a first moiré pattern, a second periodic structure (109) intended to interfere with said periodic array of light spots for generating a second moiré pattern, said second periodic structure (109) being arranged perpendicularly to said first periodic structure (108). The invention also relates to an apparatus for reading and/or writing said information carrier (101).

    摘要翻译: 本发明涉及一种旨在由光点的周期性阵列读取和/或写入的信息载体(101),所述信息载体(101)包括由一组基本数据区域定义的数据区域(105),第一 旨在干扰所述周期性阵列的光点以产生第一莫尔图案的周期性结构(108),旨在干扰所述周期性阵列的光斑以产生第二莫尔图案的第二周期性结构(109),所述第二周期性结构 (109)垂直于所述第一周期性结构(108)布置。 本发明还涉及用于读取和/或写入所述信息载体(101)的装置。