公开(公告)号：US20210300851A1

公开(公告)日：2021-09-30

申请号：US17213324

申请日：2021-03-26

申请人： Fujifilm Electronic Materials U.S.A., Inc.

发明人： Eduardo Ramirez Romero ,  David Bollinger

IPC分类号： C07C29/80 ,  B01D15/08 ,  B01D71/36 ,  B01D71/26

摘要： The present disclosure is directed to methods and systems of purifying solvents. The purified solvents can be used for cleaning a semiconductor substrate in a multistep semiconductor manufacturing process.

公开(公告)号：US20230257331A1

公开(公告)日：2023-08-17

申请号：US18138450

申请日：2023-04-24

申请人： Fujifilm Electronic Materials U.S.A., Inc.

发明人： Eduardo Ramirez Romero ,  David Bollinger

IPC分类号： C07C29/80 ,  B01D15/08 ,  B01D71/26 ,  B01D71/36

CPC分类号： C07C29/80 ,  B01D15/08 ,  B01D71/26 ,  B01D71/36 ,  B01D2257/80 ,  B01D2311/2623

摘要： The present disclosure is directed to methods and systems of purifying solvents. The purified solvents can be used for cleaning a semiconductor substrate in a multistep semiconductor manufacturing process.

公开(公告)号：US12043592B2

公开(公告)日：2024-07-23

申请号：US17213324

申请日：2021-03-26

申请人： Fujifilm Electronic Materials U.S.A., Inc.

发明人： Eduardo Ramirez Romero ,  David Bollinger

IPC分类号： C07C29/80 ,  B01D15/08 ,  B01D71/26 ,  B01D71/36

CPC分类号： C07C29/80 ,  B01D15/08 ,  B01D71/261 ,  B01D71/262 ,  B01D71/36 ,  B01D2257/80 ,  B01D2311/2512 ,  B01D2311/2623

摘要： The present disclosure is directed to methods and systems of purifying solvents. The purified solvents can be used for cleaning a semiconductor substrate in a multistep semiconductor manufacturing process.

公开(公告)号：US20210387937A1

公开(公告)日：2021-12-16

申请号：US17342581

申请日：2021-06-09

申请人： Fujifilm Electronic Materials U.S.A., Inc.

发明人： Yuan Chen ,  Eduardo Ramirez Romero ,  Bryan Hinzie

IPC分类号： C07C45/78 ,  B01J20/26 ,  C11D7/50 ,  C11D11/00 ,  B01D3/14 ,  B01D39/16 ,  B01D36/00

摘要： The present disclosure is directed to methods and systems of purifying solvents. The purified solvents can be used, e.g., as pre-wet liquids, solution developers, and cleaners in a multistep semiconductor manufacturing process.

公开(公告)号：US11440866B2

公开(公告)日：2022-09-13

申请号：US17342581

申请日：2021-06-09

申请人： Fujifilm Electronic Materials U.S.A., Inc.

发明人： Yuan Chen ,  Eduardo Ramirez Romero ,  Bryan Hinzie

IPC分类号： C07C45/82 ,  B01D3/00 ,  C07C45/78 ,  B01D3/14 ,  B01D39/16 ,  B01D36/00 ,  C11D11/00 ,  B01J20/26 ,  C11D7/50

摘要： The present disclosure is directed to methods and systems of purifying solvents. The purified solvents can be used, e.g., as pre-wet liquids, solution developers, and cleaners in a multistep semiconductor manufacturing process.

公开(公告)号：US20210300850A1

公开(公告)日：2021-09-30

申请号：US17213325

申请日：2021-03-26

申请人： Fujifilm Electronic Materials U.S.A., Inc.

发明人： Eduardo Ramirez Romero ,  David Bollinger

IPC分类号： C07C29/76 ,  B01D15/08 ,  B01D71/36 ,  B01D71/26

摘要： The present disclosure is directed to methods and systems of purifying solvents. The purified solvents can be used for cleaning a semiconductor substrate in a multistep semiconductor manufacturing process.