Polishing machine
    1.
    发明申请

    公开(公告)号:US20040043713A1

    公开(公告)日:2004-03-04

    申请号:US10648680

    申请日:2003-08-25

    CPC classification number: B24B37/08

    Abstract: The polishing machine is capable of evenly applying a pressing force from an upper polishing plate to work pieces accommodated in through-holes of carriers. The polishing machine comprises: a plurality of the carriers provided around a center of gravity of an upper polishing plate and sandwiched between the polishing plates. Circular motion of the carriers, without revolving, are performed independently. Centers of gravity of the work pieces, which are held by the carriers, are simultaneously moved close to a center of gravity of the upper polishing plate and simultaneously moved away therefrom, and moving distances of the centers of gravity of the work pieces are equal.

Patent Agency Ranking