SLURRY PROCESSING FOR DEPOSITION OF RARE EARTH HAFNIUM TANTALATE BASED BARRIER COATINGS

    公开(公告)号:US20220380268A1

    公开(公告)日:2022-12-01

    申请号:US17330514

    申请日:2021-05-26

    Abstract: Methods of forming sintered coatings are provided, along with the resulting coatings on a substrate. The sintered coating may comprise a rare earth compound and a sintering aid, with the rare earth compound has the formula: A1−bBbZ1−dDdMO6 where A is Al, Ga, In, Sc, Y, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Fe, Cr, Co, Mn, Bi, or a mixture thereof; b is 0 to about 0.5; Z is Hf, Ti, or a mixture thereof; D is Zr, Ce, Ge, Si, or a mixture thereof; d is 0 to about 0.5; and M is Ta, Nb, or a mixture thereof. The coating may be densified at a sintering temperature, such as 1300° C. to 1600° C.

    Slurry processing for deposition of rare earth hafnium tantalate based barrier coatings

    公开(公告)号:US11851380B2

    公开(公告)日:2023-12-26

    申请号:US17330514

    申请日:2021-05-26

    CPC classification number: C04B41/009 C04B2235/3224

    Abstract: Methods of forming sintered coatings are provided, along with the resulting coatings on a substrate. The sintered coating may comprise a rare earth compound and a sintering aid, with the rare earth compound has the formula: A1−bBbZ1−dDdMO6 where A is Al, Ga, In, Sc, Y, Ce, Pr, Nd, Pm, Sm, Eu, Gd, Tb, Dy, Ho, Er, Tm, Yb, Lu, Fe, Cr, Co, Mn, Bi, or a mixture thereof; b is 0 to about 0.5; Z is Hf, Ti, or a mixture thereof; D is Zr, Ce, Ge, Si, or a mixture thereof; d is 0 to about 0.5; and M is Ta, Nb, or a mixture thereof. The coating may be densified at a sintering temperature, such as 1300° C. to 1600° C.

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