公开(公告)号：US11602949B2

公开(公告)日：2023-03-14

申请号：US15734923

申请日：2019-05-28

Applicant: GIESECKE+DEVRIENT CURRENCY TECHNOLOGY GMBH

Inventor： Tobias Sattler ,  Karlheinz Mayer ,  Maik Rudolf Johann Scherer ,  Kai Hermann Scherer ,  Raphael Dehmel ,  Christian Fuhse ,  Michael Rahm ,  Manfred Heim ,  Matthias Pfeiffer ,  Yana Kisselova-Weckerle ,  Thomas Mang ,  Jorg Anders

IPC: B42D25/369 ,  B42D25/29 ,  B42D25/324 ,  B42D25/378 ,  B42D25/425 ,  B41F9/00 ,  B41F23/08

Abstract: A method for manufacturing a value document includes: providing a value document substrate; printing the value document substrate with magnetically orientable effect pigments which are dispersed in a UV-curable lacquer; the step of exposing the lacquer containing the magnetically orientable effect pigments to a dynamic magnetic field; the step of irradiating the lacquer containing the effect pigments with UV radiation; and optionally the step of embossing the cured or at least partially cured UV lacquer.

公开(公告)号：US10322601B2

公开(公告)日：2019-06-18

申请号：US15562214

申请日：2016-01-13

Applicant: GIESECKE+DEVRIENT CURRENCY TECHNOLOGY GMBH

Inventor： Christoph Mengel ,  Peter Franz ,  Thanh-Hao Huynh ,  Karlheinz Mayer ,  Christian Fuhse ,  Stefan Bichlmeier ,  Matthias Pfeiffer ,  Christof Baldus

IPC: B42D15/00 ,  B41M3/14 ,  B42D25/324 ,  B42D25/351 ,  B42D25/355 ,  B42D25/373 ,  B42D25/378 ,  B42D25/425 ,  B41M1/04 ,  B41M1/10 ,  B41M1/12 ,  B42D25/23 ,  B42D25/24 ,  B42D25/29 ,  B42D25/309 ,  B42D25/364

Abstract: A value and safety document comprises a substrate having a front side and a back side. An ink layer is applied to the front or back sides of the substrate. A first motif is incorporated into the ink layer, and is combined with a second motif. The second motif is arranged on the same side of the substrate as the first motif. The second motif is configured in the form of an emboss structure comprising a plurality of raised emboss elements having areas of different orientation. The emboss structure forms the second motif having a second tilt or motion effect, by different groups of emboss elements, having different characteristic parameters, reflecting incident light in different spatial areas. The emboss elements have respectively a lateral dimension of less than 30 μm and a height of less than 10 μm. The first motif is adapted at least partially to the second motif.