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公开(公告)号：US11702548B2
公开(公告)日：2023-07-18
申请号：US16648895
申请日：2018-06-05
发明人： Christian Fuhse , Manfred Heim , Patrick Renner , Michael Rahm , Thomas Mang , Christoph Mengel , Peter Schiffmann , Maik Rudolf Johann Scherer , Christoph Hunger
IPC分类号： B32B43/00 , C09C3/04 , B42D25/378 , C09D11/037 , B31F1/07 , B42D25/40 , B42D25/425 , B42D25/369 , B42D25/373 , B44C1/22 , B44C1/24 , B32B27/10
CPC分类号： C09C3/04 , B31F1/07 , B32B43/006 , B42D25/378 , B42D25/40 , B42D25/425 , C09D11/037 , B31F2201/00 , B32B27/10 , B42D25/369 , B42D25/373 , B44C1/227 , B44C1/24 , Y10T156/11
摘要： A method for producing pigments having a specified contour, comprises the steps of creating a pigment layer on a starting substrate; detaching from the starting substrate; and structuring the pigment layer into a plurality of the pigments; characterized by bringing into contact the pigment layer with an intermediate substrate, wherein the pigment layer adheres at least in sections to the intermediate substrate; and separating intermediate substrate and starting substrate.
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公开(公告)号：US11034182B2
公开(公告)日：2021-06-15
申请号：US16644302
申请日：2018-09-19
发明人： Christian Fuhse , Michael Rahm , Manfred Heim , Patrick Renner , Peter Schiffmann , Christoph Mengel
IPC分类号： B42D25/378 , B42D25/324 , B42D25/369 , B42D25/373 , B42D25/425 , C09D7/40 , C09D5/36 , C09D11/037 , C09D11/101 , C09D11/50 , B42D25/29
摘要： A platelet-shaped pigment with a layer construction comprises the following layers in the order, optionally a carrier substrate; a transparent embossing lacquer layer with an embossed relief structure; a reflection-increasing coating which follows the relief structure and forms a reflecting microstructure, wherein the reflecting microstructure is present in the form of a mosaic of a multiplicity of reflecting mosaic elements and the reflecting mosaic elements do not reflect the incident light in the direction of the specular reflex, regarding the plane of the platelet, but in a spatial direction deviating therefrom and respectively have a lateral dimension 1 greater than 2 μm.
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公开(公告)号：US20220266621A1
公开(公告)日：2022-08-25
申请号：US17627761
申请日：2020-07-14
发明人： Raphael Dehmel , Yana Kisselova-Weckerle , Christoph Mengel , Christian Fuhse , Pierre Degott , Claude-Alain Despland , Arnault Weber , Gisele Baudin , Andrea Callegari
IPC分类号： B42D25/324 , B42D25/369
摘要： It is disclosed a security element comprising a substantially flat substrate including first and second areas, wherein the first area displays a first motif and generates a first color movement effect to be seen in the first motif while the substrate gets tilted over a first angular tilting range, the second area displays a second motif and generates a second color effect to be seen in the second motif and within a second angular tilting range, the first and second angular tilting ranges are different, and the first area comprises either a micro-mirror structure or a print of magnetically oriented pigments and the second area comprises the other one of the micro-mirror structure and the print of magnetically oriented pigments.
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公开(公告)号：US10322601B2
公开(公告)日：2019-06-18
申请号：US15562214
申请日：2016-01-13
发明人： Christoph Mengel , Peter Franz , Thanh-Hao Huynh , Karlheinz Mayer , Christian Fuhse , Stefan Bichlmeier , Matthias Pfeiffer , Christof Baldus
IPC分类号： B42D15/00 , B41M3/14 , B42D25/324 , B42D25/351 , B42D25/355 , B42D25/373 , B42D25/378 , B42D25/425 , B41M1/04 , B41M1/10 , B41M1/12 , B42D25/23 , B42D25/24 , B42D25/29 , B42D25/309 , B42D25/364
摘要： A value and safety document comprises a substrate having a front side and a back side. An ink layer is applied to the front or back sides of the substrate. A first motif is incorporated into the ink layer, and is combined with a second motif. The second motif is arranged on the same side of the substrate as the first motif. The second motif is configured in the form of an emboss structure comprising a plurality of raised emboss elements having areas of different orientation. The emboss structure forms the second motif having a second tilt or motion effect, by different groups of emboss elements, having different characteristic parameters, reflecting incident light in different spatial areas. The emboss elements have respectively a lateral dimension of less than 30 μm and a height of less than 10 μm. The first motif is adapted at least partially to the second motif.
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