公开(公告)号：US09131589B2

公开(公告)日：2015-09-08

申请号：US14290483

申请日：2014-05-29

Applicant: GIGAPHOTON INC.

Inventor： Hideyuki Hayashi ,  Kazuhiro Suzuki ,  Osamu Wakabayashi

IPC: H05G2/00 ,  H01S3/10 ,  H01S3/23 ,  H01S3/00

CPC classification number: H05G2/008 ,  H01S3/005 ,  H01S3/10015 ,  H01S3/10038 ,  H01S3/2316 ,  H05G2/006

Abstract: An extreme ultraviolet light generation apparatus may include a chamber containing a plasma generation region irradiated by a pulse laser beam from a laser apparatus, a target supply device configured to supply a plurality of targets consecutively to the plasma generation region in the chamber, a target detection unit configured to detect a target outputted from the target supply device, and a laser controller configured to control the laser apparatus; the laser controller generating a light emission trigger instructing a laser device included in the laser apparatus to emit a pulse laser beam, and outputting the generated light emission trigger to the laser apparatus, in accordance with a detection signal from the target detection unit; and the laser controller adjusting generation of the light emission trigger outputted consecutively to the laser apparatus so that a time interval of the light emission trigger is within a predetermined range.

Abstract translation: 极紫外线发生装置可以包括：包含由来自激光装置的脉冲激光束照射的等离子体产生区域的室，被配置为连续地向室内的等离子体产生区域供给多个目标的目标供给装置，目标检测 被配置为检测从目标供给装置输出的目标的单元，以及被配置为控制所述激光装置的激光控制器; 所述激光控制器生成指示所述激光装置所具备的激光装置发射脉冲激光束的发光触发器，并且根据来自所述目标检测部的检测信号将所生成的发光触发信号输出到所述激光装置; 并且所述激光控制器调整所述发光触发器的产生，连续输出到所述激光装置，使得所述发光触发的时间间隔在预定范围内。

公开(公告)号：US09468082B2

公开(公告)日：2016-10-11

申请号：US14814983

申请日：2015-07-31

Applicant: GIGAPHOTON INC.

Inventor： Hideyuki Hayashi ,  Kazuhiro Suzuki ,  Osamu Wakabayashi

IPC: H05G2/00 ,  H01S3/10 ,  H01S3/00 ,  H01S3/23

CPC classification number: H05G2/008 ,  H01S3/005 ,  H01S3/10015 ,  H01S3/10038 ,  H01S3/2316 ,  H05G2/006

Abstract: An extreme ultraviolet light generation apparatus may include a chamber containing a plasma generation region irradiated by a pulse laser beam from a laser apparatus, a target supply device configured to supply a plurality of targets consecutively to the plasma generation region in the chamber, a target detection unit configured to detect a target outputted from the target supply device, and a laser controller configured to control the laser apparatus; the laser controller generating a light emission trigger instructing a laser device included in the laser apparatus to emit a pulse laser beam, and outputting the generated light emission trigger to the laser apparatus, in accordance with a detection signal from the target detection unit; and the laser controller adjusting generation of the light emission trigger outputted consecutively to the laser apparatus so that a time interval of the light emission trigger is within a predetermined range.