公开(公告)号：US20140332700A1

公开(公告)日：2014-11-13

申请号：US14339172

申请日：2014-07-23

Applicant: GIGAPHOTON INC.

Inventor： Miwa IGARASHI ,  Yukio WATANABE ,  Kouji ASHIKAWA ,  Norio IWAI ,  Osamu WAKABAYASHI

IPC: H05G2/00 ,  G21K5/10

CPC classification number: H05G2/008 ,  G21K5/10 ,  H05G2/003

Abstract: An apparatus for generating extreme ultraviolet light may include a reference member, a chamber fixed to the reference member, the chamber including at least one window, a laser beam introduction optical system configured to introduce an externally supplied laser beam into the chamber through the at least one window, and a positioning mechanism configured to position the laser beam introduction optical system to the reference member.

Abstract translation: 用于产生极紫外光的装置可以包括参考构件，固定到参考构件的腔室，所述腔室包括至少一个窗口，激光束引入光学系统，其配置成通过至少一个外部供应的激光束 一个窗口，以及配置成将激光束引入光学系统定位到参考构件的定位机构。