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    CONTINUOUS SCANNING FOR PARTICLE RADIATION THERAPY
    2.
    发明公开
    CONTINUOUS SCANNING FOR PARTICLE RADIATION THERAPY 审中-公开

    公开(公告)号：US20240252840A1

    公开(公告)日：2024-08-01

    申请号：US18560021

    申请日：2022-05-13

    申请人： Elekta, Inc.

    发明人： Stuart Julian Swerdloff

    IPC分类号： A61N5/10 ,  G21K1/093 ,  G21K5/04 ,  G21K5/10

    CPC分类号： A61N5/1043 ,  A61N5/103 ,  A61N5/1071 ,  G21K1/093 ,  G21K5/04 ,  G21K5/10 ,  A61N5/1081 ,  A61N2005/1087

    摘要： Systems and techniques may be used for determining a line segment to be delivered from a particle beam towards a target. An example technique may include continuously scanning the particle beam at a constant rate from a starting point to an ending point, and determining a plurality of spots located between the starting point and the ending point. The technique may include determining a plurality of beamlets based on the plurality of spots, and determining, using an amount of dose to be delivered via each beamlet, a total amount of dose to be delivered. The technique may include generating a line segment having the starting point and the ending point, the line segment having the total amount of dose to be delivered based on the plurality of beamlets.

    Compact X-Ray Images
    4.
    发明申请
    Compact X-Ray Images 审中-公开

    公开(公告)号：US20180108447A1

    公开(公告)日：2018-04-19

    申请号：US15568708

    申请日：2016-04-22

    申请人： TURNER INNOVATIONS, LLC.

    发明人： D. Clark Turner ,  Thomas L. Youd

    IPC分类号： G21K5/10 ,  G21K4/00

    CPC分类号： G21K5/10 ,  A61B6/107 ,  A61B6/4405 ,  A61B6/4411 ,  A61B6/4441 ,  A61B6/4452 ,  A61B6/4482 ,  A61B6/462 ,  A61B6/487 ,  A61B6/54 ,  A61B6/548 ,  A61B6/56 ,  G01T7/00 ,  G21K4/00 ,  G21K2004/12

    摘要： Small, portable, and collapsible X-ray devices are described in this application. In particular, this application describes a portable X-ray device that contains a C-shaped support arm, an X-ray source contained near one end of the support arm, and an X-ray detector contained near the other end of the support arm, and the X-ray source is enclosed in a housing that also encloses a power source and a power supply. The X-ray device is portable since it can be configured to be carried by hand from location to location without using wheels or a gantry. The C-shaped support arm capable of rotating around an object to be analyzed that remains in a substantially fixed location when removably attached to a support structure using a connection that also allows the connection point to slide along the arc of the C-shaped support arm. The x-ray device can be quickly de-coupled from the support structure for handheld or table-top use. The C-shaped support arm can be configured to change the location of the X-ray source and X-ray detector relative to each other by being collapsible, reducing the volume of the x-ray device making it easier to transport. Other embodiments are described.

    APPARATUS TO EMIT THERAPEUTIC RADIATIONS
    7.
    发明申请
    APPARATUS TO EMIT THERAPEUTIC RADIATIONS 审中-公开
    装置治疗放射治疗

    公开(公告)号：US20150248945A1

    公开(公告)日：2015-09-03

    申请号：US14430003

    申请日：2013-09-13

    申请人： ASA SRL

    发明人： Roberto Marchesini ,  Lucio Zaghetto

    IPC分类号： G21K5/10 ,  A61N5/02 ,  A61N2/00 ,  A61N5/01 ,  A61N5/06 ,  A61N5/10

    CPC分类号： G21K5/10 ,  A61N2/00 ,  A61N5/01 ,  A61N5/02 ,  A61N5/06 ,  A61N5/10 ,  A61N5/1081 ,  A61N2005/0632 ,  A61N2005/0642 ,  A61N2005/0651 ,  A61N2005/067

    摘要： Apparatus to emit therapeutic radiations comprising at least an emitter of radiations configured to emit radiations toward a base plane containing an axis of displacement, movement means configured to selectively move said emitter of radiations both along a second path, arched and lying on a first lying plane passing through the axis of displacement, and also along a third path arched and lying on a second lying plane passing through an axis of rotation, perpendicular to the axis of displacement. The movement means are configured to move the emitter of radiations also along a first path substantially rectilinear and parallel to the axis of displacement, so as to move the emitter of radiations parallel to the base plane.

    摘要翻译： 用于发射治疗辐射的装置，包括至少辐射发射器，其配置成向包含位移轴线的基底平面发射辐射;移动装置，被配置为选择性地沿着第二路径移动辐射发射体，所述第二路径是拱形的并且位于第一躺卧平面上 穿过位移轴线，并且还沿着拱形并位于通过垂直于位移轴线的旋转轴线的第二平躺平面上的第三路径。 移动装置被配置为也沿着基本上直线并且平行于位移轴线的第一路径移动辐射发射器，以便平行于基底平面移动辐射发射器。

    OPERATING PROCESS FOR AN IRRADIATION DEVICE
    8.
    发明申请
    OPERATING PROCESS FOR AN IRRADIATION DEVICE 有权
    辐射装置的操作过程

    公开(公告)号：US20150235727A1

    公开(公告)日：2015-08-20

    申请号：US14621624

    申请日：2015-02-13

    申请人： Heraeus Noblelight GmbH

    发明人： Josef Zoltan LOTT ,  Karl-Wilhelm BRIEDEN ,  Silke SCHLOEMP

    IPC分类号： G21K5/10

    CPC分类号： G21K5/10 ,  A61L2/10 ,  B41F23/0406 ,  B41F23/0409 ,  B65B55/16 ,  H01L21/263 ,  H01L21/324

    摘要： Known operating processes for an irradiation device for irradiating a substrate by a UV emitter include the process steps of: (a) operating the UV emitter at a nominal operating radiation power; (b) continuously feeding the substrate at a feed rate into the irradiation field; and (c) irradiating the substrate in the irradiation field defined by the UV emitter. In order to devise, on this basis, a simple and inexpensive operating process for an irradiation device, which makes a short start-up time feasible after an interruption of the production process, the UV emitter is switched off when there is an interruption of the continuous substrate feed. The emitter temperature of the switched-off UV emitter is measured, and provisions are made for counter-measures to counteract a decrease of the emitter temperature by more than 10° C. below the nominal operating temperature.

    摘要翻译： 用于通过UV发射器照射衬底的照射装置的已知操作过程包括以下工艺步骤：（a）以标称工作辐射功率操作UV发射器; （b）以进料速率将基板连续进料到照射场中; 和（c）在由UV发射体限定的照射场中照射衬底。 为了在此基础上设计用于照射装置的简单且廉价的操作过程，其在制造过程中断之后使得启动时间很短，则当发生中断时，UV发射器被切断 连续底物进料。 测量关闭的紫外线发射器的发射极温度，并作出相应措施，以将发射极温度降低超过标称工作温度10°C以下。

    Processes And Systems For Laser Crystallization Processing Of Film Regions On A Substrate Utilizing A Line-Type Beam, And Structures Of Such Film Regions
    9.
    发明申请
    Processes And Systems For Laser Crystallization Processing Of Film Regions On A Substrate Utilizing A Line-Type Beam, And Structures Of Such Film Regions 审中-公开
    使用线型梁的基板上的膜区域的激光结晶处理和这种膜区域的结构的方法和系统

    公开(公告)号：US20140361414A1

    公开(公告)日：2014-12-11

    申请号：US14311570

    申请日：2014-06-23

    申请人： The Trustees Of Columbia University In the City Of New York

    发明人： James S Im ,  Paul Christiaan van der Wilt

    IPC分类号： G21K5/02 ,  H01L29/04 ,  G21K5/10

    CPC分类号： H01L21/02686 ,  C30B13/24 ,  C30B35/00 ,  G21K5/02 ,  G21K5/10 ,  H01L21/02678 ,  H01L21/2026 ,  H01L27/1285 ,  H01L27/1296 ,  H01L29/04

    摘要： Process and system for processing a thin film sample, as well as at least one portion of the thin film structure are provided. Irradiation beam pulses can be shaped to define at least one line-type beam pulse, which includes a leading portion, a top portion and a trailing portion, in which at least one part has an intensity sufficient to at least partially melt a film sample. Irradiating a first portion of the film sample to at least partially melt the first portion, and allowing the first portion to resolidify and crystallize to form an approximately uniform area therein. After the irradiation of the first portion of the film sample, irradiating a second portion using a second one of the line-type beam pulses to at least partially melt the second portion, and allowing the second portion to resolidify and crystallize to form an approximately uniform area therein. A section of the first portion impacted by the top portion of the first one of the line-type beam pulses is prevented from being irradiated by trailing portion of the second one of the line-type beam pulses.

    摘要翻译： 提供了用于处理薄膜样品的方法和系统，以及薄膜结构的至少一部分。 辐射束脉冲可以被成形为限定至少一个线型束脉冲，其包括前导部分，顶部部分和尾部部分，其中至少一个部分具有足以至少部分地熔化膜样品的强度。 辐射薄膜样品的第一部分以至少部分地熔化第一部分，并允许第一部分重新凝固并结晶以在其中形成大致均匀的区域。 在照射第一部分薄膜样品之后，使用第二种线型束脉冲照射第二部分以至少部分地熔化第二部分，并允许第二部分重新凝固并结晶以形成近似均匀的 区域。 由第一线路型光束脉冲的顶部部分影响的第一部分的一部分被第二线路型光束脉冲的后部部分照射。

    EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS
    10.
    发明申请
    EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS 有权
    极光紫外线发光装置

    公开(公告)号：US20140332700A1

    公开(公告)日：2014-11-13

    申请号：US14339172

    申请日：2014-07-23

    申请人： GIGAPHOTON INC.

    发明人： Miwa IGARASHI ,  Yukio WATANABE ,  Kouji ASHIKAWA ,  Norio IWAI ,  Osamu WAKABAYASHI

    IPC分类号： H05G2/00 ,  G21K5/10

    CPC分类号： H05G2/008 ,  G21K5/10 ,  H05G2/003

    摘要： An apparatus for generating extreme ultraviolet light may include a reference member, a chamber fixed to the reference member, the chamber including at least one window, a laser beam introduction optical system configured to introduce an externally supplied laser beam into the chamber through the at least one window, and a positioning mechanism configured to position the laser beam introduction optical system to the reference member.

    摘要翻译： 用于产生极紫外光的装置可以包括参考构件，固定到参考构件的腔室，所述腔室包括至少一个窗口，激光束引入光学系统，其配置成通过至少一个外部供应的激光束 一个窗口，以及配置成将激光束引入光学系统定位到参考构件的定位机构。