公开(公告)号：US09411249B2

公开(公告)日：2016-08-09

申请号：US14033593

申请日：2013-09-23

Applicant: GLOBALFOUNDRIES INC.

Inventor： Christopher P. Ausschnitt ,  Timothy A. Brunner

IPC: G01B9/00 ,  G03B27/32 ,  G03B27/52 ,  G03C5/00 ,  G03F7/20 ,  G03F9/00

CPC classification number: G03F7/70641 ,  G03F7/70625 ,  G03F7/70683 ,  G03F9/7026

Abstract: A dose and focus monitor structure includes at least one complementary set of unit dose monitors and at least one complementary set of unit focus monitors. Each complementary set of unit dose monitors generate edges on a photoresist layer such that the edges move in opposite directions as a function of a dose offset. Each complementary set of unit focus monitors generates edges on the photoresist layer such that the edges move in opposite directions as a function of a focus offset. The dose and focus monitor structure generates self-compensating differential measurements of the dose offset and the focus offset such that the dose offset measurement and the focus offset measurement are independent of each other.

Abstract translation: 剂量和聚焦监测器结构包括至少一个互补的单位剂量监测器组和至少一个互补的单位焦点监测器组。 每个补充的单位剂量监测器组在光致抗蚀剂层上产生边缘，使得边缘作为剂量偏移的函数沿相反方向移动。 每个互补的单元聚焦监视器组在光致抗蚀剂层上产生边缘，使得边缘作为聚焦偏移的函数沿相反方向移动。 剂量和聚焦监测结构产生剂量偏移和聚焦偏移的自补偿差分测量，使得剂量偏移测量和聚焦偏移测量彼此独立。