公开(公告)号：US20190101834A1

公开(公告)日：2019-04-04

申请号：US15720182

申请日：2017-09-29

Applicant: GLOBALFOUNDRIES INC.

Inventor： Liang Cao ,  Wenchao Jiang ,  Guoxiang Ning ,  Jie Zhang

IPC: G03F7/20 ,  G05B13/04

CPC classification number: G03F7/70441 ,  G03F1/36 ,  G03F7/704 ,  G05B13/042 ,  G05B13/048

Abstract: Various aspects include vectorization approaches for model-based mask proximity correction (MPC). In some cases, a computer-implemented method includes: assigning a set of vectors to geometry data describing at least one mask for forming an integrated circuit (IC); adjusting a statistical predictive model of the at least one mask based upon the set of vectors and the geometry data; predicting an adjustment to the at least one mask with the statistical predictive model; and adjusting instructions for forming the at least one mask in response to a predicted mask result of the statistical predictive model deviating from a target mask result for the at least one mask.

公开(公告)号：US10386726B2

公开(公告)日：2019-08-20

申请号：US15720182

申请日：2017-09-29

Applicant: GLOBALFOUNDRIES INC.

Inventor： Liang Cao ,  Wenchao Jiang ,  Guoxiang Ning ,  Jie Zhang

IPC: G03F7/20 ,  G05B13/04

Abstract: Various aspects include vectorization approaches for model-based mask proximity correction (MPC). In some cases, a computer-implemented method includes: assigning a set of vectors to geometry data describing at least one mask for forming an integrated circuit (IC); adjusting a statistical predictive model of the at least one mask based upon the set of vectors and the geometry data; predicting an adjustment to the at least one mask with the statistical predictive model; and adjusting instructions for forming the at least one mask in response to a predicted mask result of the statistical predictive model deviating from a target mask result for the at least one mask.