公开(公告)号：US10386726B2

公开(公告)日：2019-08-20

申请号：US15720182

申请日：2017-09-29

Applicant: GLOBALFOUNDRIES INC.

Inventor： Liang Cao ,  Wenchao Jiang ,  Guoxiang Ning ,  Jie Zhang

IPC: G03F7/20 ,  G05B13/04

Abstract: Various aspects include vectorization approaches for model-based mask proximity correction (MPC). In some cases, a computer-implemented method includes: assigning a set of vectors to geometry data describing at least one mask for forming an integrated circuit (IC); adjusting a statistical predictive model of the at least one mask based upon the set of vectors and the geometry data; predicting an adjustment to the at least one mask with the statistical predictive model; and adjusting instructions for forming the at least one mask in response to a predicted mask result of the statistical predictive model deviating from a target mask result for the at least one mask.

公开(公告)号：US20190219933A1

公开(公告)日：2019-07-18

申请号：US15874039

申请日：2018-01-18

Applicant: GLOBALFOUNDRIES INC.

Inventor： Liang Cao ,  Jed H. Rankin ,  Jie Zhang ,  Yulu Chen

IPC: G03F7/20 ,  G06F17/50 ,  G03F1/42 ,  G03F7/26 ,  G03F9/00

Abstract: Embodiments of a method include: converting at least one image of a printed mask to a plurality of representative contours, each corresponding to mask patterns in the printed mask; determining whether the printed mask includes a printing defect based on whether the plurality of representative contours violates a set of contour tolerances for the printed mask; in response to at least one of plurality of representative contours violating at least one of the set of contour tolerances: identifying a location where a representative contour violates the at least one of the set of contour tolerances, and generating an instruction to adjust a layout for the printed mask, based on the violating of the at least one of the set of contour tolerances; and in response to none of the plurality of representative contours violating the set of contour tolerances, flagging a layout for the printed mask as compliant.

公开(公告)号：US20180322234A1

公开(公告)日：2018-11-08

申请号：US15588984

申请日：2017-05-08

Applicant: GLOBALFOUNDRIES Inc.

Inventor： Liang Cao ,  Jie Zhang ,  David N. Power ,  Eric S. Parent

IPC: G06F17/50 ,  G03F1/36

CPC classification number: G06F17/5036 ,  G03F1/36 ,  G06F17/5068 ,  G06F17/5072 ,  G06F17/5081 ,  G06F2217/12

Abstract: Methods according to the disclosure include: predicting process-sensitive geometries (PSGs) in a proposed IC layout based on violations of a set of processing constraints for the proposed IC layout, the set of processing constraints being calculated with a predictive model based on a training data repository having a plurality of optical rule check (ORC) simulations for different IC layouts; identifying actual PSGs in a circuit manufactured using the proposed IC layout; determining whether the predicted PSGs correspond to the actual PSGs in the manufactured circuit as being correct; in response to the predicting being incorrect: adjusting the predictive model based on the actual PSGs, wherein the adjusting includes submitting additional ORC data to the training data repository; and flagging the proposed IC layout as incorrectly predicted; and in response to the predicting being correct, flagging the proposed IC layout as correctly predicted.

公开(公告)号：US20190101834A1

公开(公告)日：2019-04-04

申请号：US15720182

申请日：2017-09-29

Applicant: GLOBALFOUNDRIES INC.

Inventor： Liang Cao ,  Wenchao Jiang ,  Guoxiang Ning ,  Jie Zhang

IPC: G03F7/20 ,  G05B13/04

CPC classification number: G03F7/70441 ,  G03F1/36 ,  G03F7/704 ,  G05B13/042 ,  G05B13/048

Abstract: Various aspects include vectorization approaches for model-based mask proximity correction (MPC). In some cases, a computer-implemented method includes: assigning a set of vectors to geometry data describing at least one mask for forming an integrated circuit (IC); adjusting a statistical predictive model of the at least one mask based upon the set of vectors and the geometry data; predicting an adjustment to the at least one mask with the statistical predictive model; and adjusting instructions for forming the at least one mask in response to a predicted mask result of the statistical predictive model deviating from a target mask result for the at least one mask.

公开(公告)号：US10564554B2

公开(公告)日：2020-02-18

申请号：US15874039

申请日：2018-01-18

Applicant: GLOBALFOUNDRIES INC.

Inventor： Liang Cao ,  Jed H. Rankin ,  Jie Zhang ,  Yulu Chen

IPC: G03F7/20 ,  G06F17/50 ,  G03F1/42 ,  G03F7/26 ,  G03F9/00 ,  G03F1/36 ,  G03F1/84 ,  G03F1/70 ,  H01L21/027 ,  H01L21/66

Abstract: Embodiments of a method include: converting at least one image of a printed mask to a plurality of representative contours, each corresponding to mask patterns in the printed mask; determining whether the printed mask includes a printing defect based on whether the plurality of representative contours violates a set of contour tolerances for the printed mask; in response to at least one of plurality of representative contours violating at least one of the set of contour tolerances: identifying a location where a representative contour violates the at least one of the set of contour tolerances, and generating an instruction to adjust a layout for the printed mask, based on the violating of the at least one of the set of contour tolerances; and in response to none of the plurality of representative contours violating the set of contour tolerances, flagging a layout for the printed mask as compliant.

公开(公告)号：US10402524B2

公开(公告)日：2019-09-03

申请号：US15588984

申请日：2017-05-08

Applicant: GLOBALFOUNDRIES Inc.

Inventor： Liang Cao ,  Jie Zhang ,  David N. Power ,  Eric S. Parent

IPC: G06F17/50 ,  G03F1/36

Abstract: Methods according to the disclosure include: predicting process-sensitive geometries (PSGs) in a proposed IC layout based on violations of a set of processing constraints for the proposed IC layout, the set of processing constraints being calculated with a predictive model based on a training data repository having a plurality of optical rule check (ORC) simulations for different IC layouts; identifying actual PSGs in a circuit manufactured using the proposed IC layout; determining whether the predicted PSGs correspond to the actual PSGs in the manufactured circuit as being correct; in response to the predicting being incorrect: adjusting the predictive model based on the actual PSGs, wherein the adjusting includes submitting additional ORC data to the training data repository; and flagging the proposed IC layout as incorrectly predicted; and in response to the predicting being correct, flagging the proposed IC layout as correctly predicted.