公开(公告)号：US09329495B2

公开(公告)日：2016-05-03

申请号：US14084676

申请日：2013-11-20

Applicant: GLOBALFOUNDRIES Inc.

Inventor： Xintuo Dai ,  Binbin Yan

IPC: G01B11/00 ,  G03F7/20

CPC classification number: G03F7/70633

Abstract: Overlay metrology systems are provided which include, for instance: a first metrology pattern including at least two first pairs of sub-patterns, at least one sub-pattern lacking 90 degree rotational symmetry, and a first center position for the first metrology pattern being determinable in an X-Y coordinate layout from the at least two first pairs of sub-patterns; and a second metrology including at least two second pairs of sub-patterns, at least one sub-pattern lacking 90 degree rotational symmetry, and a second center position for the second metrology pattern being determinable in the X-Y coordinate layout from the at least two second pairs of sub-patterns. Methods of making overlay metrology systems are also provided, which include, for instance, providing a first metrology pattern and a second metrology pattern, and arranging the metrology patterns in relation to each other within the X-Y coordinate layout.

Abstract translation: 提供覆盖度量系统，其包括例如：包括至少两个第一对子图案的第一计量图案，缺少90度旋转对称的至少一个子图案，以及用于第一计量模式的第一中心位置是可确定的 在来自所述至少两个第一对子图案的XY坐标布局中; 以及第二计量学，其包括至少两个第二对子图案，至少一个缺少90度旋转对称的子图案，以及用于所述第二计量图案的第二中心位置可以在所述XY坐标布局中从所述至少两个第二 一对子模式。 还提供了制作覆盖计量系统的方法，其包括例如提供第一计量模式和第二计量模式，以及在X-Y坐标布局内彼此相关地布置计量模式。