公开(公告)号：US09397012B2

公开(公告)日：2016-07-19

申请号：US14316915

申请日：2014-06-27

Applicant: GLOBALFOUNDRIES Inc.

Inventor： Deniz E. Civay ,  Ralph Schlief

IPC: H01L21/8242 ,  H01L21/66 ,  H01L21/78 ,  G01B11/00 ,  G03F1/44

CPC classification number: H01L22/12 ,  G01B11/002 ,  G03F1/44 ,  G03F7/70625 ,  G03F7/70683 ,  H01L21/78 ,  H01L22/30

Abstract: A method includes forming a first plurality of instances of a first pattern on a substrate. The first pattern includes a plurality of features defining a first spacing between features in a first direction. The instances in the first plurality are offset from one another at least in a second direction other than the first direction. The substrate is cleaved along a cleavage line. At least a first critical dimension of a feature in the first plurality of instances intersected by the cleavage line is measured.

Abstract translation: 一种方法包括在衬底上形成第一图案的第一多个实例。 第一图案包括限定第一方向上的特征之间的第一间隔的多个特征。 第一多个中的实例至少在除了第一方向之外的第二方向上彼此偏移。 底物沿切割线切割。 测量由切割线相交的第一多个实例中的特征的至少第一临界尺寸。

公开(公告)号：US20150380320A1

公开(公告)日：2015-12-31

申请号：US14316915

申请日：2014-06-27

Applicant: GLOBALFOUNDRIES Inc.

Inventor： Deniz E. Civay ,  Ralph Schlief

IPC: H01L21/66 ,  G01B11/00 ,  H01L21/78

CPC classification number: H01L22/12 ,  G01B11/002 ,  G03F1/44 ,  G03F7/70625 ,  G03F7/70683 ,  H01L21/78 ,  H01L22/30

Abstract: A method includes forming a first plurality of instances of a first pattern on a substrate. The first pattern includes a plurality of features defining a first spacing between features in a first direction. The instances in the first plurality are offset from one another at least in a second direction other than the first direction. The substrate is cleaved along a cleavage line. At least a first critical dimension of a feature in the first plurality of instances intersected by the cleavage line is measured.

Abstract translation: 一种方法包括在衬底上形成第一图案的第一多个实例。 第一图案包括限定第一方向上的特征之间的第一间隔的多个特征。 第一多个中的实例至少在除了第一方向之外的第二方向上彼此偏移。 底物沿切割线切割。 测量由切割线相交的第一多个实例中的特征的至少第一临界尺寸。