公开(公告)号：US20200012252A1

公开(公告)日：2020-01-09

申请号：US16029759

申请日：2018-07-09

Applicant: GLOBALFOUNDRIES Inc.

Inventor： Richard P. Good ,  Eyup Cinar

IPC: G05B19/401

Abstract: A method for initializing individual exposure field parameters of an overlay controller is disclosed including initializing a first control thread having a first context associated with a first product type, wherein a first layout of first exposure fields is defined for the first product type for processing in a stepper. The method further includes remapping a set of previous control state data for a set of control threads associated with other product types different than the first product type into the first layout. The other product types have layouts of second exposure fields different than the first layout. An initial set of control state data for the first control thread associated with the first product type is generated using the remapped previous control state data. The stepper is configured for processing a first substrate of the first product type using the initial set of control state data.

公开(公告)号：US20190129390A1

公开(公告)日：2019-05-02

申请号：US15795431

申请日：2017-10-27

Applicant: GLOBALFOUNDRIES Inc.

Inventor： Richard P. Good ,  Dirk Gleitsmann ,  Daniel Zschaebitz

IPC: G05B19/418

Abstract: Methods according to the disclosure include: identifying at least one non-candidate tool which previously processed at least one prior semiconductor wafer, and represented in a set of historical data, the set of historical data including manufacturing settings for performing an operation on the at least one prior semiconductor wafer, and a candidate tool which has not previously performed the operation on at least one prior semiconductor wafer, the candidate tool not being represented in the set of historical data; determining whether the set of historical data predicts the performing of the operation with the candidate tool based on the manufacturing settings for performing the operation on the at least one prior semiconductor wafer; and in response to the set of historical data predicting the performing of the operation with the candidate tool, selecting a manufacturing setting for the candidate tool based on the set of historical data.

公开(公告)号：US10481592B2

公开(公告)日：2019-11-19

申请号：US15795431

申请日：2017-10-27

Applicant: GLOBALFOUNDRIES Inc.

Inventor： Richard P. Good ,  Dirk Gleitsmann ,  Daniel Zschaebitz

IPC: G05B19/418

Abstract: Methods according to the disclosure include: identifying at least one non-candidate tool which previously processed at least one prior semiconductor wafer, and represented in a set of historical data, the set of historical data including manufacturing settings for performing an operation on the at least one prior semiconductor wafer, and a candidate tool which has not previously performed the operation on at least one prior semiconductor wafer, the candidate tool not being represented in the set of historical data; determining whether the set of historical data predicts the performing of the operation with the candidate tool based on the manufacturing settings for performing the operation on the at least one prior semiconductor wafer; and in response to the set of historical data predicting the performing of the operation with the candidate tool, selecting a manufacturing setting for the candidate tool based on the set of historical data.

公开(公告)号：US20140100806A1

公开(公告)日：2014-04-10

申请号：US13644788

申请日：2012-10-04

Applicant: GLOBALFOUNDRIES INC.

Inventor： Richard P. Good ,  Thorsten Schepers

IPC: G01N37/00 ,  G06F19/00

CPC classification number: G05B23/0237

Abstract: A method includes receiving tool trace data from a group of tools of the same type in a computing device. A tool fingerprint is generated for each tool using the tool trace data for the tools in group other than the tool for which the tool fingerprint is generated in the computing device. A tool score is generated for each tool based on its tool trace data and its associated fingerprint in the computing device. A fault condition with at least a selected tool is identified based on the tool scores in the computing device.

Abstract translation: 一种方法包括从计算设备中相同类型的一组工具接收工具跟踪数据。 使用工具的工具跟踪数据为每个工具生成工具指纹，而不是在计算设备中生成工具指纹的工具以外的工具。 根据其在计算设备中的工具跟踪数据及其相关指纹，为每个工具生成工具得分。 基于计算设备中的工具得分来识别至少具有所选择的工具的故障状况。

公开(公告)号：US10788806B2

公开(公告)日：2020-09-29

申请号：US16029759

申请日：2018-07-09

Applicant: GLOBALFOUNDRIES Inc.

Inventor： Richard P. Good ,  Eyup Cinar

IPC: G05B19/401 ,  G06F30/20 ,  G03F1/00 ,  H01L21/266

Abstract: A method for initializing individual exposure field parameters of an overlay controller is disclosed including initializing a first control thread having a first context associated with a first product type, wherein a first layout of first exposure fields is defined for the first product type for processing in a stepper. The method further includes remapping a set of previous control state data for a set of control threads associated with other product types different than the first product type into the first layout. The other product types have layouts of second exposure fields different than the first layout. An initial set of control state data for the first control thread associated with the first product type is generated using the remapped previous control state data. The stepper is configured for processing a first substrate of the first product type using the initial set of control state data.