APPARATUS FOR IRRADIATING A SUBSTRATE
    1.
    发明公开

    公开(公告)号:US20230173803A1

    公开(公告)日:2023-06-08

    申请号:US17923859

    申请日:2021-04-06

    申请人: GUNTHER ACKERMANN

    发明人: GUNTHER ACKERMANN

    IPC分类号: B41F23/04 H05B3/00 H05K7/20

    摘要: The invention relates to an apparatus (1) for irradiating a substrate (2), which apparatus comprises a platform (4), which is straight or curved in relation to the longitudinal axis (3) of the platform (4), wherein one, two, three, four, five, six, seven, eight, nine, ten or more irradiation modules (6) and/or substrate supply air modules (36) and/or substrate exhaust air modules (37) are reversibly attachable directly or indirectly to the bottom side (8) of the platform (4) by sliding or inserting or mounting in one or more fixed or telescoping module attachment devices (10) provided on the bottom side (8) of the platform (4) - each extending from the front side (5) of the apparatus (1) and in the direction of the back side (9) of the apparatus (1).