TARGET SUBSTANCE REPLENISHMENT DEVICE, EXTREME ULTRAVIOLET LIGHT GENERATION APPARATUS, AND ELECTRONIC DEVICE MANUFACTURING METHOD

    公开(公告)号:US20230008733A1

    公开(公告)日:2023-01-12

    申请号:US17831255

    申请日:2022-06-02

    Abstract: A target substance replenishment device may include a first container containing a solid target substance, a first path through which the solid target substance supplied from the first container passes, a first supply switching device switching between a first state where supply of the solid target substance from the first container to the first path is suppressed and a second state where the supply of the solid target substance from the first container to the first path is allowed, a first valve connected to the first path, a second path which is connected to the first valve and through which the solid target substance having passed through the first valve passes, a first detector outputting a first detection signal indicating that the second path is clogged with the solid target substance, and a processor controlling the first supply switching device to the first state based on the first detection signal.

    TARGET SUPPLY DEVICE AND EUV LIGHT GENERATION APPARATUS

    公开(公告)号:US20180341180A1

    公开(公告)日:2018-11-29

    申请号:US16052466

    申请日:2018-08-01

    Abstract: A target supply device may include a tank for storing a target material, a nozzle which is connected to the tank and outputs the target material, and a gas supply section for supplying the tank with gas. The gas supply section may include a booster which is connected to a gas line, boosts the gas supplied from the gas line, and outputs the boosted gas to the tank, a pressure sensor for measuring the pressure inside the tank, and a pressure controller which adjusts the pressure of the gas to be supplied to the tank on the basis of a measurement result from the pressure sensor.

    TARGET SUPPLY DEVICE AND EUV LIGHT GENERATION APPARATUS
    3.
    发明申请
    TARGET SUPPLY DEVICE AND EUV LIGHT GENERATION APPARATUS 审中-公开
    目标供应装置和EUV发光装置

    公开(公告)号:US20160377986A1

    公开(公告)日:2016-12-29

    申请号:US15260625

    申请日:2016-09-09

    CPC classification number: G03F7/70033 H01L21/027 H05G2/005 H05G2/006 H05G2/008

    Abstract: A target supply device may include a tank for storing a target material, a nozzle which is connected to the tank and outputs the target material, and a gas supply section for supplying the tank with gas. The gas supply section may include a booster which is connected to a gas line, boosts the gas supplied from the gas line, and outputs the boosted gas to the tank, a pressure sensor for measuring the pressure inside the tank, and a pressure controller which adjusts the pressure of the gas to be supplied to the tank on the basis of a measurement result from the pressure sensor.

    Abstract translation: 目标供给装置可以包括用于存储目标材料的罐,连接到罐并输出目标材料的喷嘴,以及用于向罐供应气体的气体供应部。 气体供给部可以包括与气体管线连接的升压器,对从气体管线供给的气体进行升压,并将升压气体输出到水箱,用于测量罐内的压力的压力传感器和压力控制器, 基于来自压力传感器的测量结果来调节供给到罐的气体的压力。

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