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公开(公告)号：US20240242991A1
公开(公告)日：2024-07-18
申请号：US18432196
申请日：2024-02-05
发明人： Ming-Chien Chiu , Chia-Ho Chuang , Kuo-Hua Lee , Shu-Hung Lin , Chia-Ch Lin
IPC分类号： H01L21/673
CPC分类号： H01L21/67359 , H01L21/67379 , H01L21/67386
摘要： The present invention provides a reticle pod comprising a lower cover and a support mechanism. The lower cover includes a carrying surface and a plurality of securing seats distributed on the carrying surface. The support mechanism includes a supporting portion extending upward for supporting a reticle or a reticle carrier, and a securing portion opposite the supporting portion, wherein the securing portion is detachably connected with a corresponding securing seat, so that the support mechanism can be selectively installed on the lower cover.
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公开(公告)号：US20230054753A1
公开(公告)日：2023-02-23
申请号：US17882703
申请日：2022-08-08
发明人： Ming-Chien Chiu , CHIA-HO CHUANG , Kuo-Hua Lee , Shu-Hung Lin , Hao-Kang HSIA
IPC分类号： H01L21/673
摘要： The present invention provides a wafer container and a gas diffusion device applied in the wafer container. The wafer container includes a shell, and all components included and applied on the shell are made of thermal resistance materials. The gas diffusion device and the wafer container, when assembled together, utilize a coupling structure and a collar as a protection mechanism for the gas diffusion device. The gas diffusion device has a buffering chamber that provides a buffering tolerance and a communicating space for the gas before the gas enters an interior space of the wafer container.
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公开(公告)号：US12017841B2
公开(公告)日：2024-06-25
申请号：US17363328
申请日：2021-06-30
发明人： Ming-Chien Chiu , Chia-Ho Chuang , Kuo-Hua Lee , Shu-Hung Lin , Hao-Kang Hsia
IPC分类号： B65D81/18 , B65D85/30 , H01L21/673
CPC分类号： B65D85/30 , B65D81/18 , H01L21/67379 , H01L21/67389
摘要： A substrate container including a container body, a filter member, a back cover is provided. The container body having a top face, a bottom face opposing the top face, a back plate of a first height connecting the top face and the bottom face, a front opening located between the top face and the bottom face, and a back opening opposing the front opening. The front opening enables passage of a substrate and the back opening is located on the back plate and has a smaller second height. The filter member covers the back opening. The back cover establishes sealing engagement with the container body. A gas guiding channel extending in a direction of the first height is formed between the back cover and the container body. The back cover and the filter member define a buffering compartment, and the gas guiding channel has an outlet connecting the buffering compartment.
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公开(公告)号：US20240186163A1
公开(公告)日：2024-06-06
申请号：US18372202
申请日：2023-09-25
发明人： Ming-Chien CHIU , Chia-Ho CHUANG , Kuo-Hua Lee , Xin-Yuan HUANG , En-Nien Shen , Jyun-Ming Lyu
IPC分类号： H01L21/67 , H01L21/673
CPC分类号： H01L21/67288 , H01L21/67259 , H01L21/67389
摘要： The present invention provides a measuring apparatus for measuring a wafer carrier having an opening end and at least one gas tower deposited inside, the measuring apparatus comprising a carrying interface for securing the wafer carrier. The opening end of the wafer carrier faces an inspection space of measuring apparatus. The carrying interface having a gas supplying assembly connected to a base of the wafer carrier so as to supply gas to the wafer carrier. The internal of the inspection space disposed a measuring assembly which is mainly used to measure gas flow rate from the gas tower in the accommodating space. The measuring assembly comprises a plurality of wind speed sensing elements and a plurality of displacement sensing element, which are fitted to the a second connecting element.
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公开(公告)号：US20220238362A1
公开(公告)日：2022-07-28
申请号：US17195783
申请日：2021-03-09
发明人： Ming-Chien Chiu , Chia-Ho Chuang , Kuo-Hua Lee , Shu-Hung Lin , Chia-Ch Lin
IPC分类号： H01L21/673
摘要： The present invention provides a reticle pod comprising a lower cover and a support mechanism. The lower cover includes a carrying surface and a plurality of securing seats distributed on the carrying surface. The support mechanism includes a supporting portion extending upward for supporting a reticle or a reticle carrier, and a securing portion opposite the supporting portion, wherein the securing portion is detachably connected with a corresponding securing seat, so that the support mechanism can be selectively installed on the lower cover.
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