FOCAL POSITION ESTIMATION SYSTEM, FOCAL POSITION ESTIMATION METHOD, FOCAL POSITION ESTIMATION PROGRAM, SEMICONDUCTOR INSPECTION SYSTEM AND BIOLOGICAL OBSERVATION SYSTEM

    公开(公告)号:US20240160089A1

    公开(公告)日:2024-05-16

    申请号:US18570881

    申请日:2022-03-10

    CPC classification number: G03B13/36 G02B7/28

    Abstract: A focal position estimation system is a system for estimating a focal position when in focus corresponding to an estimation target image, and includes: an estimation target image acquisition unit that acquires an estimation target image; and a focal position estimation unit that outputs a feature quantity of the estimation target image from the estimation target image by using a feature quantity output model and estimates a focal position when in focus corresponding to the estimation target image from the output feature quantity, wherein the feature quantity output model is generated by machine learning from a plurality of learning images associated with focal position information related to a focal position at the time of imaging, and feature quantities of two different learning images are compared with each other according to focal position information associated with the two different learning images, and machine learning is performed based on the comparison result.

    AUTOFOCUS ASSISTANCE METHOD, AUTOFOCUS ASSISTANCE DEVICE, AND AUTOFOCUS ASSISTANCE PROGRAM

    公开(公告)号:US20240402092A1

    公开(公告)日:2024-12-05

    申请号:US18698876

    申请日:2022-06-22

    Abstract: An autofocus support method according to an embodiment supports autofocus for a semiconductor device having a substrate and a device pattern formed on one main surface side of the substrate. The method includes: a step of acquiring a first image focused on the substrate; a step of acquiring a spatial frequency image from the first image by Fourier transform and generating mask data for masking linear patterns in the same direction on the substrate based on the spatial frequency image; a step of performing filtering on a plurality of second images, which are captured by using an imaging device while changing the focal position of the imaging device on the other main surface side of the substrate, by using the mask data; and a step of focusing the imaging device on the device pattern based on the second image after filtering.

    FEATURE OUTPUT MODEL GENERATION SYSTEM, FEATURE OUTPUT MODEL GENERATION METHOD, FEATURE OUTPUT MODEL GENERATION PROGRAM, AND FEATURE OUTPUT MODEL

    公开(公告)号:US20240290080A1

    公开(公告)日:2024-08-29

    申请号:US18570937

    申请日:2022-03-10

    CPC classification number: G06V10/778 G06V10/751

    Abstract: A feature quantity output model generation system is a system for generating a feature quantity output model to which information based on an image is input and which outputs a feature quantity of the image, and includes: a learning image acquisition unit that acquires a plurality of learning images associated with focal position information related to a focal position at the time of imaging; and a feature quantity output model generation unit that generates a feature quantity output model by machine learning from the acquired learning images, wherein the feature quantity output model generation unit compares the feature quantities of two different learning images according to focal position information associated with the two different learning images and performs machine learning based on the comparison result.

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