公开(公告)号：US20220238317A1

公开(公告)日：2022-07-28

申请号：US17719121

申请日：2022-04-12

Applicant: HAMAMATSU PHOTONICS K.K.

Inventor： Miu TAKIMOTO ,  Takayuki OHMURA ,  Masahiro KOTANI

IPC: H01J49/00 ,  H01J49/04

Abstract: A sample support is a sample support for sample ionization, including: a substrate formed with a plurality of through holes opening to a first surface and a second surface on a side opposite to the first surface; a conductive layer provided not to block the through hole in the first surface; and a frame body provided in a peripheral portion of the substrate to surround an ionization region in which a sample is ionized when viewed in a thickness direction of the substrate, in which a marker for recognizing a position in the ionization region is provided in the frame body.

公开(公告)号：US20210028002A1

公开(公告)日：2021-01-28

申请号：US16966122

申请日：2018-12-12

Applicant: HAMAMATSU PHOTONICS K.K.

Inventor： Miu TAKIMOTO ,  Takayuki OHMURA ,  Masahiro KOTANI

IPC: H01J49/04 ,  H01J49/16

Abstract: A sample support body for ionizing a sample, including: a first layer formed with a plurality of first through holes; a conductive layer provided on a surface of the first layer; and a second layer provided on the first layer on a side opposite to the conductive layer and formed with a plurality of second through holes, in which the plurality of first through holes and the plurality of second through holes extend in a thickness direction of the first layer and the second layer, each of the plurality of second through holes is communicated with one or more first through holes of the plurality of first through holes, a width of the first through hole is smaller than a width of the second through hole, and an opening rate of the first through hole is less than an opening rate of the second through hole.

公开(公告)号：US20230025534A1

公开(公告)日：2023-01-26

申请号：US17958649

申请日：2022-10-03

Applicant: HAMAMATSU PHOTONICS K.K.

Inventor： Miu TAKIMOTO ,  Takayuki Ohmura ,  Masahiro Kotani

IPC: H01J49/04 ,  H01J49/00 ,  G01N27/62

Abstract: A sample support is a sample support for sample ionization, including: a substrate formed with a plurality of through holes opening to a first surface and a second surface on a side opposite to the first surface; a conductive layer provided not to block the through hole in the first surface; and a reinforcement member disposed inside a part of the plurality of through holes.

公开(公告)号：US20210319991A1

公开(公告)日：2021-10-14

申请号：US17259580

申请日：2019-07-25

Applicant: HAMAMATSU PHOTONICS K.K.

Inventor： Miu TAKIMOTO ,  Takayuki OHMURA ,  Masahiro KOTANI

IPC: H01J49/00 ,  H01J49/04

Abstract: A sample support is a sample support for sample ionization, including: a substrate formed with a plurality of through holes opening to a first surface and a second surface on a side opposite to the first surface; a conductive layer provided not to block the through hole in the first surface; and a frame body provided in a peripheral portion of the substrate to surround an ionization region in which a sample is ionized when viewed in a thickness direction of the substrate, in which a marker for recognizing a position in the ionization region is provided in the frame body.

公开(公告)号：US20210257201A1

公开(公告)日：2021-08-19

申请号：US17262596

申请日：2019-06-19

Applicant: HAMAMATSU PHOTONICS K.K.

Inventor： Miu TAKIMOTO ,  Takayuki OHMURA ,  Masahiro KOTANI

IPC: H01J49/04 ,  H01J49/00

Abstract: A sample support is a sample support for sample ionization, including: a substrate formed with a plurality of through holes opening to a first surface and a second surface on a side opposite to the first surface; a conductive layer provided not to block the through hole in the first surface; and a reinforcement member disposed inside a part of the plurality of through holes.