X-ray generation using electron beam

    公开(公告)号:US11145481B1

    公开(公告)日:2021-10-12

    申请号:US16846401

    申请日:2020-04-13

    Abstract: An X-ray generation apparatus includes an electron gun emitting an electron beam having a circular cross-sectional shape, a magnetic focusing lens located downstream of the electron gun and focusing the electron beam while rotating the electron beam around an axis along a first direction, a magnetic quadrupole lens located downstream of the magnetic focusing lens and deforming the cross-sectional shape of the electron beam into an elliptical shape having a major axis along a second direction orthogonal to the first direction and a minor axis along a third direction orthogonal to the first direction and the second direction, and a target located downstream of the magnetic quadrupole lens and emitting an X-ray in response to incidence of the electron beam.

Patent Agency Ranking