公开(公告)号：US20240310726A1

公开(公告)日：2024-09-19

申请号：US18575583

申请日：2022-06-30

Applicant: HELIO DISPLAY MATERIALS LIMITED

Inventor： Gerardus Keyzer DE KEYZER ,  Nobuya SAKAI ,  Bernard WENGER

IPC: G03F7/004 ,  C09K11/02 ,  C09K11/06 ,  G02B5/20 ,  G03F7/00 ,  G03F7/029 ,  G03F7/031 ,  G03F7/033 ,  G03F7/038 ,  G03F7/20

CPC classification number: G03F7/0047 ,  C09K11/02 ,  C09K11/06 ,  G02B5/206 ,  G03F7/0007 ,  G03F7/0035 ,  G03F7/029 ,  G03F7/031 ,  G03F7/033 ,  G03F7/0384 ,  G03F7/2002

Abstract: The present invention relates to a process for producing a patterned film comprising particles comprising an AMX compound, which process comprises: (a) providing a photoresist layer disposed on a substrate, which photoresist layer comprises a mixture of a photoresist and particles comprising an AMX compound; (b) defining a pattern on the photoresist layer by exposing regions of the photoresist layer to light and thereby producing a patterned photoresist layer; and (c) treating the patterned photoresist layer with a developer to produce the patterned film comprising particles comprising an AMX compound. The developer may comprise a solvent which has a dielectric constant of at least 6.0. The invention also relates to a process for producing a patterned colour conversion layer and a process for producing a device (such as a display). Further related to the invention is a device intermediate.