FOCUSED ION BEAM PROCESSING APPARATUS

    公开(公告)号:US20210296080A1

    公开(公告)日:2021-09-23

    申请号:US17207184

    申请日:2021-03-19

    Abstract: Provided is a focused ion beam processing apparatus including: an ion source; a sample stage a condenser lens; an aperture having a slit in a straight line shape; a projection lens and the sample stage, wherein, in a transfer mode, by Köhler illumination, with an applied voltage of the condenser lens when a focused ion beam is focused on a main surface of the projection lens scaled to be 100, the applied voltage is set to be less than 100 and greater than or equal to 80; a position of the aperture is set such that the focused ion beam is masked by the aperture with the one side of the aperture at a distance greater than 0 μm and equal to or less than 500 μm from a center of the focused ion beam; and the shape of the slit is transferred onto the sample.

    FOCUSED ION BEAM DEVICE
    2.
    发明公开

    公开(公告)号:US20240355574A1

    公开(公告)日:2024-10-24

    申请号:US18687706

    申请日:2021-09-01

    Abstract: An ion beam tube of a composite beam device is provided with an ion source and an ion optics. The ion optics is provided with a diaphragm member in which at least one through-hole that is switchable in order to pass part of an ion beam generated from the ion source therethrough is formed. The ion optics is provided with a blocking member that blocks part of the ion beam passing through the through-hole of the diaphragm member, and a blocking drive mechanism that drives the blocking member. The blocking drive mechanism performs switching between the presence and absence of blocking of the ion beam passing through the through-hole of the diaphragm member by the blocking member in a state where the ion optics maintains a predetermined optical condition.

    PARTICLE BEAM APPARATUS AND COMPOSITE BEAM APPARATUS

    公开(公告)号:US20210296079A1

    公开(公告)日:2021-09-23

    申请号:US17202993

    申请日:2021-03-16

    Abstract: Provided is a particle beam apparatus capable of performing appropriate switching selectively between charged particle beam and neutral particle beam. A particle beam column (19) includes an ion source (41), a condenser lens (52), a charge exchange grid (55), and an objective lens (56). The ion source (41) generates ions. The condenser lens (52) changes focusing of the ion beam so that switching is performed between ion beam and neutral beam as particle beam with which a sample (S) is irradiated. The charge exchange grid (55) converts at least a part of ion beam into neutral particle beam through neutralization. The objective lens (56) is placed downstream of the charge exchange grid (55). The objective lens (56) reduces the ion beam toward the sample (S) when the sample (S) is irradiated with the neutral particle beam as the particle beam.

    CHARGED PARTICLE BEAM APPARATUS, COMPOSITE CHARGED PARTICLE BEAM APPARATUS, AND CONTROL METHOD FOR CHARGED PARTICLE BEAM APPARATUS

    公开(公告)号:US20210118645A1

    公开(公告)日:2021-04-22

    申请号:US17072678

    申请日:2020-10-16

    Abstract: The charged particle beam apparatus includes: a charged particle source configured to generate charged particles; a plurality of scanning electrodes configured to generate electric fields for deflecting charged particles that are emitted by applying an acceleration voltage to the charged particle source, and applying an extraction voltage to an extraction electrode configured to extract the charged particles; an electrostatic lens, which is provided between the plurality of scanning electrodes and a sample table, and is configured to focus a charged particle beam deflected by the plurality of scanning electrodes; and a processing unit configured to obtain a measurement condition, and set each of scanning voltages to be applied to the plurality of scanning electrodes based on the obtained measurement condition.

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