公开(公告)号：US20130240720A1

公开(公告)日：2013-09-19

申请号：US13839989

申请日：2013-03-15

Applicant: HITACHI HIGH-TECH SCIENCE CORPORTION

Inventor： Yasuhiko SUGIYAMA ,  Tatsuya ASAHATA ,  Toshio DOI ,  Hiroshi OBA

IPC: H01J3/14

CPC classification number: H01J3/14 ,  H01J37/304 ,  H01J2237/0458 ,  H01J2237/30433 ,  H01J2237/30472 ,  H01J2237/31749

Abstract: Provided is a focused ion beam apparatus including a control portion configured to: store in advance, in a condenser voltage table, a calculation value of a condenser voltage for obtaining a reference beam current for all each of a plurality of apertures; obtain an experimental value of the condenser voltage for obtaining the reference beam current for a reference aperture; obtain a correction value of the condenser voltage by subtracting the calculation value stored for the reference aperture from the experimental value for the reference aperture; obtain setting values of the condenser voltage by adding the correction value to the calculation values stored for each of the plurality of the apertures; and store the obtained setting value in the condenser voltage table.

Abstract translation: 提供了一种聚焦离子束装置，其包括控制部分，该控制部分被配置为：预先存储在聚光器电压表中的用于获得多个孔中的每一个的参考光束电流的聚光器电压的计算值; 获得用于获得参考光圈的参考光束电流的电容器电压的实验值; 通过从参考孔径的实验值中减去存储在参考孔径上的计算值来获得冷凝器电压的校正值; 通过将所述校正值与对于所述多个孔中的每一个存储的计算值相加来获得所述冷凝器电压的设定值; 并将获得的设定值存储在冷凝器电压表中。