公开(公告)号：US20190178813A1

公开(公告)日：2019-06-13

申请号：US16311103

申请日：2016-07-04

Applicant: HITACHI HIGH-TECHNOLOGIES CORPORATION

Inventor： Hisaaki KANAI ,  Masami MAKUUCHI ,  Yukihisa MOHARA ,  Eiji IMAI

IPC: G01N21/95 ,  G01N21/956

CPC classification number: G01N21/9501 ,  G01N21/956

Abstract: A defect inspection apparatus includes a light irradiation unit irradiating a sample placed on a table unit with illumination light, a detection optical system forming a scattered light image from the sample and detecting the generated scattered light image through an image sensor, a processing unit receiving a signal from the image sensor of the detection optical system that detects the scattered light image, generating an image of the scattered light, and detecting a defect of the sample by processing the generated image, an output unit outputting the defect image processed by the image processing unit, and a control unit controlling the stable unit, the light irradiation unit, the detection optical system, and the image processing unit. The image processing unit includes an image generation unit that receives the signal and generates the image, a correction unit that corrects lightness discontinuity and a defect detection unit for image processing.