DEVICE FOR MEASURING SUPERFINE PARTICLE MASSES
    1.
    发明申请
    DEVICE FOR MEASURING SUPERFINE PARTICLE MASSES 有权
    用于测量超细颗粒物质的装置

    公开(公告)号:US20100083737A1

    公开(公告)日:2010-04-08

    申请号:US12532474

    申请日:2008-02-27

    IPC分类号: G01N29/02

    摘要: A device for measuring superfine particle masses including a quartz oscillator and an exposure system having at least two measuring chambers. Each of the at least two measuring chambers has a same geometry, a deposition surface for particles, and an aerosol feed directed at the respective disposition surface configured to feed an aerosol onto the respective deposition surface. At least one of the respective deposition surfaces is disposed on the quartz oscillator.

    摘要翻译: 一种用于测量包括石英振荡器和具有至少两个测量室的曝光系统的超微粒子质量的装置。 所述至少两个测量室中的每一个具有相同的几何形状,用于颗粒的沉积表面,以及指向相应配置表面的气溶胶进料,其构造成将气溶胶馈送到相应的沉积表面上。 各个沉积表面中的至少一个设置在石英振荡器上。

    Device for measuring superfine particle masses
    2.
    发明授权
    Device for measuring superfine particle masses 有权
    超微粒子质量测量装置

    公开(公告)号:US08225681B2

    公开(公告)日:2012-07-24

    申请号:US12532474

    申请日:2008-02-27

    IPC分类号: G01G9/00

    摘要: A device for measuring superfine particle masses including a quartz oscillator and an exposure system having at least two measuring chambers. Each of the at least two measuring chambers has a same geometry, a deposition surface for particles, and an aerosol feed directed at the respective disposition surface configured to feed an aerosol onto the respective deposition surface. At least one of the respective deposition surfaces is disposed on the quartz oscillator.

    摘要翻译: 一种用于测量包括石英振荡器和具有至少两个测量室的曝光系统的超微粒子质量的装置。 所述至少两个测量室中的每一个具有相同的几何形状,用于颗粒的沉积表面,以及指向相应配置表面的气溶胶进料,其构造成将气溶胶馈送到相应的沉积表面上。 各个沉积表面中的至少一个设置在石英振荡器上。