公开(公告)号：US07342642B2

公开(公告)日：2008-03-11

申请号：US11155885

申请日：2005-06-20

申请人： Henricus Wilhelmus Maria Van Buel ,  Peter Ten Berge ,  Markus Theodoor Wilhelmus Van Der Heijden

发明人： Henricus Wilhelmus Maria Van Buel ,  Peter Ten Berge ,  Markus Theodoor Wilhelmus Van Der Heijden

IPC分类号： G03B27/52 ,  G03B27/42

CPC分类号： G03F9/7011 ,  G03F9/7084 ,  G03F9/7088

摘要： A method of pre-aligning a substrate in a lithographic apparatus is described. The substrate has at least one alignment mark provided on a side of the substrate. The method includes determining a relationship between a position of the at least one alignment mark, at least part of an edge of the substrate, and a center of the substrate. A substrate support is provided to support a substrate, the substrate support having at least one optical view window at a predetermined location to view a part of the side of the substrate. The substrate is placed on the substrate support on the basis of the relationship to position the at least one alignment mark in the at least one optical view window.

摘要翻译： 描述了在光刻设备中预对准衬底的方法。 衬底具有设置在衬底一侧上的至少一个对准标记。 所述方法包括确定所述至少一个对准标记的位置与所述基板的边缘的至少一部分与所述基板的中心之间的关系。 提供衬底支撑件以支撑衬底，衬底支撑件在预定位置处具有至少一个光学视窗，以观察衬底侧面的一部分。 基于该关系将基板放置在基板支撑件上，以将至少一个对准标记定位在至少一个光学视窗中。