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公开(公告)号：US06815699B2
公开(公告)日：2004-11-09
申请号：US10314447
申请日：2002-12-09
IPC分类号： G21K510
CPC分类号： G03F7/70716 , G03F7/70758
摘要： A lithographic projection apparatus, in which movement of a substrate table in a plane is accomplished by a planar magnetic positioning device, has a mechanical limiter that limits rotation of the substrate table about a direction orthogonal to the plane.
摘要翻译： 在平面中通过平面磁定位装置实现平面中的基板台的运动的光刻投影装置具有限制基板台绕与该平面正交的方向的旋转的机械限制器。
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公开(公告)号：US07446850B2
公开(公告)日：2008-11-04
申请号：US11002454
申请日：2004-12-03
申请人： Ronald Johannes Hultermans , Ton De Groot , Jacobus Johannus Leonardus Hendricus Verspay , Gerardus Everardus Marie Hannen
发明人： Ronald Johannes Hultermans , Ton De Groot , Jacobus Johannus Leonardus Hendricus Verspay , Gerardus Everardus Marie Hannen
CPC分类号： G03F7/70341 , G03F7/70866 , G03F7/70925
摘要： An immersion lithographic apparatus is disclosed having comprising a pump and buffer volume configured to remove remaining liquid from a substrate, the pump and the buffer volume configured to generate a vacuum cleaning gas flow near the substrate by gas suction into the buffer volume. In an embodiment, since gas flow is needed only a limited amount of time (ordinarily less than 5%), evacuation may be performed using only a moderately powered vacuum pump. In addition or alternatively, the buffer volume may be used as a backup volume buffer configured to provide gas vacuum suction, e.g., in case of a vacuum supply outage.
摘要翻译： 公开了一种浸没式光刻设备，其包括构造成从衬底去除剩余液体的泵和缓冲体积，所述泵和缓冲体积构造成通过气体吸入到缓冲体积中而在衬底附近产生真空清洁气体流。 在一个实施方案中，由于仅需要有限量的时间（通常小于5％），因此只能使用中等功率的真空泵进行排气。 另外或替代地，缓冲器体积可以用作配置为提供气体真空吸力的备用体积缓冲器，例如在真空供应中断的情况下。
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公开(公告)号：US20100315610A1
公开(公告)日：2010-12-16
申请号：US12820970
申请日：2010-06-22
申请人： Ronald Johannes Hultermans , Ton De Groot , Jacobus Johannus Leonardus Hendricus Verspay , Gerardus Everadus Marie Hannen
发明人： Ronald Johannes Hultermans , Ton De Groot , Jacobus Johannus Leonardus Hendricus Verspay , Gerardus Everadus Marie Hannen
CPC分类号： G03F7/70341 , G03F7/70866 , G03F7/70925
摘要： An immersion lithographic apparatus is disclosed having comprising a pump and buffer volume configured to remove remaining liquid from a substrate, the pump and the buffer volume configured to generate a vacuum cleaning gas flow near the substrate by gas suction into the buffer volume. In an embodiment, since gas flow is needed only a limited amount of time (ordinarily less than 5%), evacuation may be performed using only a moderately powered vacuum pump. In addition or alternatively, the buffer volume may be used as a backup volume buffer configured to provide gas vacuum suction, e.g., in case of a vacuum supply outage.
摘要翻译： 公开了一种浸没式光刻设备，其包括构造成从衬底去除剩余液体的泵和缓冲体积，所述泵和缓冲体积构造成通过气体吸入到缓冲体积中而在衬底附近产生真空清洁气体流。 在一个实施方案中，由于仅需要有限量的时间（通常小于5％），因此只能使用中等功率的真空泵进行排气。 另外或替代地，缓冲器体积可以用作配置为提供气体真空吸力的备用体积缓冲器，例如在真空供应中断的情况下。
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公开(公告)号：US07764356B2
公开(公告)日：2010-07-27
申请号：US12232971
申请日：2008-09-26
申请人： Ronald Johannes Hultermans , Ton De Groot , Jacobus Johannus Leonardus Hendricus Verspay , Gerardus Everardus Marie Hannen
发明人： Ronald Johannes Hultermans , Ton De Groot , Jacobus Johannus Leonardus Hendricus Verspay , Gerardus Everardus Marie Hannen
CPC分类号： G03F7/70341 , G03F7/70866 , G03F7/70925
摘要： An immersion lithographic apparatus is disclosed having comprising a pump and buffer volume configured to remove remaining liquid from a substrate, the pump and the buffer volume configured to generate a vacuum cleaning gas flow near the substrate by gas suction into the buffer volume. In an embodiment, since gas flow is needed only a limited amount of time (ordinarily less than 5%), evacuation may be performed using only a moderately powered vacuum pump. In addition or alternatively, the buffer volume may be used as a backup volume buffer configured to provide gas vacuum suction, e.g., in case of a vacuum supply outage.
摘要翻译： 公开了一种浸没式光刻设备，其包括构造成从衬底去除剩余液体的泵和缓冲体积，所述泵和缓冲体积构造成通过气体吸入到缓冲体积中而在衬底附近产生真空清洁气体流。 在一个实施方案中，由于仅需要有限量的时间（通常小于5％），因此只能使用中等功率的真空泵进行排气。 另外或替代地，缓冲器体积可以用作配置为提供气体真空吸力的备用体积缓冲器，例如在真空供应中断的情况下。
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