摘要:
At least one exemplary embodiment is directed to an optical scanning apparatus that employs a short wave light source to constantly maintain a spot having a tiny diameter, even when an environmental temperature change occurs, by employing a lens and/or a diffractive optical element.
摘要:
An optical scanning apparatus including a light source, deflection unit configured to deflect a light flux emitted by the light source, a first optical system configured to condense a divergent light flux emitted by the light source, a second optical system configured to focus the deflected light flux on a target scanning face, where the wavelength of the light flux is short, and the first and second optical systems include respective refractive optical elements.
摘要:
At least one exemplary embodiment is directed to an optical scanning apparatus that employs a short wave light source to constantly maintain a spot having a tiny diameter, even when an environmental temperature change occurs, by employing a lens and/or a diffractive optical element.
摘要:
An optical scanning apparatus including a light source, deflection unit configured to deflect a light flux emitted by the light source, a first optical system configured to condense a divergent light flux emitted by the light source, a second optical system configured to focus the deflected light flux on a target scanning face, where the wavelength of the light flux is short, and the first and second optical systems include respective refractive optical elements.
摘要:
A light scanning apparatus includes light source means 1 which irradiates a light beam of which a wavelength is equal to or shorter than 450 nm, deflection means 5 which uses the light beams, for scanning in deflection, emitted from the light source means, an incidence optical system LA which makes the light beam incident on the deflection means, an imaging optical system 6 which guides the light beam deflected by the deflection means onto a surface 8 to be scanned, light intensity detection means 14 which detects fluctuations in spectral transmittances of the incidence optical system and of the imaging optical system, which are caused as a concomitant of a fluctuation in wavelength of the light beam, and control means 15 which controls an output of the light source means on the basis of a detection value detected by the light intensity detection means.
摘要:
A light scanning apparatus including a semiconductor laser which emits a light beam having a wavelength equal to or less than 450 nm, an incidence optical system which makes the light beam, emitted from the semiconductor laser, incident on a deflector for scanning in deflection, an imaging optical system which images the light beam scanned in deflection by the deflector to a surface to be scanned, a light intensity detector which detects fluctuations in spectral transmittances of the incidence optical system and of the imaging optical system, which are caused as a concomitant of a fluctuation in wavelength of the light beam which is emitted from the semiconductor laser and passes through the incident optical system and the imaging optical system, and an automatic power controller which automatically controls a light emission output of the semiconductor laser on the basis of a detection value detected by the light intensity detector.
摘要:
There is provided a diffraction grid which is easily produced without reducing a grid size. There is provided an optical scanning device having effects such as a chromatic aberration correction and a temperature compensation even when a short wavelength light source having a wavelength of 500 nm or less is used, and an image forming apparatus using the optical scanning device. In the optical scanning device having the diffraction grid, for which the short wavelength light source having a wavelength of 500 nm or less is used, a design order of the diffraction grid is set to a diffraction order equal to or larger than a second order to obtain a grid shape which is easily formed.
摘要:
Disclosed in an optical scanning apparatus which includes a deflecting unit comprised of a rotary polygon mirror for deflecting a light beam radiated from a light source unit, and a scanning optical system for guiding the light beam deflected by the deflecting unit to a surface to be scanned. In the optical scanning apparatus, individual elements are set such that a diameter of a circumscribed circle of the rotary polygon mirror, the number of deflecting facets of the rotary polygon mirror, an incident angle of the light beam on the deflecting facet at the time when the light beam scans a scanning center, a maximum swing angle of the deflecting facet at the time when an effective scanning range is scanned, and a magnification of the scanning optical system in a sub scanning section can satisfy a predetermined condition, thereby reducing an unevenness of pitches due to a deflecting-facet fall of the rotary polygon mirror, and readily achieving a highly precise and fine image.
摘要:
There is provided a diffraction grid which is easily produced without reducing a grid size. There is provided an optical scanning device having effects such as a chromatic aberration correction and a temperature compensation even when a short wavelength light source having a wavelength of 500 nm or less is used, and an image forming apparatus using the optical scanning device. In the optical scanning device having the diffraction grid, for which the short wavelength light source having a wavelength of 500 nm or less is used, a design order of the diffraction grid is set to a diffraction order equal to or larger than a second order to obtain a grid shape which is easily formed.
摘要:
There is provided a diffraction grid which is easily produced without reducing a grid size. There is provided an optical scanning device having effects such as a chromatic aberration correction and a temperature compensation even when a short wavelength light source having a wavelength of 500 nm or less is used, and an image forming apparatus using the optical scanning device. In the optical scanning device having the diffraction grid, for which the short wavelength light source having a wavelength of 500 nm or less is used, a design order of the diffraction grid is set to a diffraction order equal to or larger than a second order to obtain a grid shape which is easily formed.